Optical film, and glass
A technology of optical film and glass, which is applied in the field of optical film, can solve problems such as insufficient shading, and achieve the effects of reducing light intrusion, preventing peeping, and preventing room temperature from rising
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Examples
Embodiment 1
[0294]
[0295] A polycarbonate film (trade name: PURE ACE, manufactured by Teijin Chemicals, Ltd.) was heated and stretched to set a birefringence value at 275 nm (retardation value at a wavelength of 550 nm), thereby preparing a half-wave plate.
[0296]
[0297] -Formation of Polarizing Film-
[0298] Spin-coat both surfaces of the half-wave plate with an alignment film solution (methanol solution) of polyvinyl alcohol (PVA) at 1,000 rpm for 30 seconds, and then dry at 100°C for 3 minutes to prepare a PVA vertical alignment film with a thickness of 1.0 μm. membrane.
[0299] -Preparation of Polarizing Film Coating Solution-
[0300] To a liquid crystal solution in which 3.04 g of a liquid crystal compound having a photopolymerizable group (trade name: PALIOCOLOR LC242, manufactured by BASF Corporation) was dissolved in 5.07 g of methyl ethyl ketone (MEK), 1.11 g of an initiator was added Solution [0.90 g of IRGACUEE 907 (manufactured by Chiba Specialty Chemicals K.K.)...
Embodiment 2
[0313]
[0314] -Formation of a half-wave plate with a transparent conductive film-
[0315] A polycarbonate film (trade name: PURE ACE, manufactured by Teijin Chemicals, Ltd.) was heated and stretched to set a birefringence value at 275 nm (retardation value at a wavelength of 550 nm), thereby preparing a half-wave plate. On both surfaces of the half-wave plate, ITO (tin-doped indium oxide) films were formed so as to have a film thickness of 120 nm, whereby a half-wave plate formed with a transparent conductive film having a resistivity of 10Ω / square was produced.
[0316] -Formation of aluminum deposition film-
[0317] On the surface of the transparent conductive film of the half-wave plate formed with the transparent conductive film, an aluminum deposition film with a film thickness of 150 nm was formed by the RF sputtering method.
[0318] -Nanopores formed by anodizing-
[0319] A laminate consisting of an aluminum deposition film and a half-wave plate formed with a ...
Embodiment 3
[0327] -Preparation of laminated glass-
[0328] The optical film of Example 1 is sandwiched between two transparent PVB films, the two surfaces of the PVB film are covered with float glass, the laminated material is placed in a rubber bag, and the rubber bag is removed under a vacuum of 2,660Pa. It was degassed for 20 minutes, placed in an oven in a degassed state, and was further subjected to vacuum pressing while maintaining a temperature of 90° C. for 30 minutes. Put the laminated glass initially bonded as above at 135°C and 118N / cm 2 Under the condition of the pressure, the laminated glass was prepared by pressure bonding in an autoclave for 20 minutes.
[0329] In the same manner as in Example 1, the division effect and light resistance of the obtained laminated glass were evaluated. Table 1 shows the evaluation results.
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Abstract
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