Double-stage switching system of photoetching machine wafer stage

Abstract

The invention provides a double-stage switching system of photoetching machine wafer stage, wherein the system comprises a wafer stage operating on exposure station and a wafer stage operating on preprocess station, the two wafer stage is fixed on a base station and suspend on upper surface by air-float bearings; each wafer stage is passed through by a guiding rail along Y direction respectively,one end of the guiding rail is connected with a main driving unit, the two wafer stages can move in Y direction along the guiding rails, the other end of the wafer stage is abutted against a single freedom degree auxiliary driving unit in X direction, and can move in X direction under drive of the single degree of freedom auxiliary driving unit; and the single degree of freedom auxiliary driving unit and the guiding rail in Y direction can implements separation and precision butt joint for implementing position switch of the two wafer stages. The system of the invention avoids accuracy requirement of sky high wafer stage dimensional uniformity caused by switch of the air-float bearing cross guide plane when the wafer stages switches, and avoids defect of high precision require of componentprocess and assembly, thereby simplifying system structure, and double-stage switch of the system is driven by mass center, thereby greatly enhancing precision of the system.

Description

technical field [0001] The invention relates to a double-swap exchange system for silicon wafer tables of a lithography machine. The system is applied to a semiconductor lithography machine and belongs to the technical field of semiconductor manufacturing equipment. Background technique [0002] In the production process of integrated circuit chips, the exposure transfer (photolithography) of the design pattern of the chip on the photoresist on the surface of the silicon wafer is one of the most important processes. The equipment used in this process is called a photolithography machine (exposure machine). The resolution and exposure efficiency of the lithography machine greatly affect the characteristic line width (resolution) and productivity of the integrated circuit chip. As the key system of the lithography machine, the motion accuracy and work efficiency of the silicon wafer ultra-precision motion positioning system (hereinafter referred to as the wafer stage) largely...

AI Technical Summary

Problems solved by technology

[0008] Aiming at the deficiencies and defects of the prior art, the purpose of the present invention is to provide a new double-stage exchange system for silicon wafer stages of a lithography machine, so as to overcome the non-centroid-driven and extremely demanding processing of the existing double-stage exchange system for silicon wafer stages. And assembly accuracy and other shortcomings, so that it has the advantages of simple structure, high space utilization and no collision between the upper linear guide rails during exchange, thereby improving the exposure efficiency of the lithography machine

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