Color filter and manufacturing method thereof

A color filter and manufacturing method technology, applied in optics, optical components, opto-mechanical equipment, etc., can solve the problems of light leakage, side light leakage, rarely accurate alignment of color filters and TFT substrates, etc., to improve performance , Improve side light leakage, improve the effect of front light leakage

Inactive Publication Date: 2009-10-14
BEIJING BOE OPTOELECTRONCIS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the actual preparation process, due to the limitation of equipment precision and process conditions, the color filter and the TFT substrate can rarely be completely aligned accurately, which leads to the existence of side light leakage and front light leakage, such as Figure 4 , Figure 5 shown

Method used

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  • Color filter and manufacturing method thereof
  • Color filter and manufacturing method thereof
  • Color filter and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0063] Such as Figure 6 , Figure 7 As shown, the step a) of making the black matrix of the present invention specifically includes the following steps:

[0064] a1) if Figure 6 As shown, a raw material layer 13 for making a black matrix is ​​coated on a glass substrate 1, a photoresist 12 is coated on the raw material layer 13, and light passes through a mask (mask) 11 to expose the photoresist 12, wherein, The mask plate 11 is pre-designed with a pattern of an increased layer, and after exposure, it is developed to remove the photoresist 12 other than the increased layer position of the black matrix on the raw material layer 13, so as to locate the increased layer position of the black matrix. The photoresist 121 at the position is post-baked;

[0065] a2) Control the etching speed and time according to the height of the pre-designed extra layer, etch the raw material layer 13, and form the extra layer 10 on the raw material layer 13;

[0066] a3) stripping off the pho...

Embodiment 2

[0071] Such as Figure 8 , Figure 9 As shown, the step a) of making the black matrix of the present invention may also specifically include the following steps:

[0072] a11) Coating a raw material layer 13 for making a black matrix on the glass substrate 1, coating a photoresist 12 on the raw material layer 13, and exposing the photoresist 12 through a mask (mask) 11′ by light, wherein, The pattern of the matrix of the black matrix is ​​pre-designed on the mask plate 11', and the photoresist 12 other than the position of the matrix on the raw material layer 13 is removed by development after exposure, so as to locate the position of the matrix of the black matrix on the raw material layer 13. After development Post-baking the photoresist 123 at the position of the substrate;

[0073] a12) etching the raw material layer 13 other than the substrate position until the glass substrate 1 is exposed;

[0074] a13) peeling off the photoresist 123 at the position of the substrate...

Embodiment 3

[0079] Such as Figure 10 As shown, the step a) of making the black matrix of the present invention may also specifically include the following steps:

[0080] a21) Coating a raw material layer 13 for making a black matrix on the glass substrate 1, coating a photoresist 12 on the raw material layer 13, and exposing the photoresist 12 through a mask (mask) 110 by light, wherein the The mask 110 is a halftone mask or a gray tone mask, and the mask 110 is divided into three areas, wherein the area 1101 is the area through which the light fully passes through, the area 1102 is the area through which the light partially passes through, and the area 1103 is The light does not pass through the region, and the mask plate 110 is used for photolithography, so that the photoresist 12 under the region 1101 can be completely removed by exposure and development, and the photoresist 12 under the region 1102 can be partially removed by exposure and development, so that The photoresist 12 bel...

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Abstract

The invention discloses a color filter. The color filter comprises color resin set alternately and a black matrix which separates the color resin, and the black matrix consists of a matrix and a heightening layer arranged on edge of the matrix. The invention further discloses a manufacturing method of the color filter. The manufacturing method comprises the following steps: a) coating a raw material layer for manufacturing the black matrix on a glass substrate, and forming the black matrix which consists of the matrix and the heightening layer arranged on the edge of the matrix by a mapping method; b) respectively forming each color resin in an area defined by the black matrix; c) forming a protective layer on surface of the black matrix and each color resin; and d) forming a transparent conductive film on the surface of the protective layer. The color filter can effectively reduce side light leakage, and be applied to LCDs.

Description

technical field [0001] The invention relates to liquid crystal display technology, in particular to a color filter used in a liquid crystal display and a manufacturing method thereof. Background technique [0002] Generally, a thin film transistor-liquid crystal display (TFT-LCD) is mainly composed of a backlight, a lower polarizer, a thin film transistor substrate (TFT substrate), a liquid crystal, a color filter (CF, Color Filter) and an upper polarizer. Among them, the color filter is an important part of the liquid crystal display, and the color image of the liquid crystal display mainly depends on the color filter. Such as figure 1 , figure 2 As shown, the color filter includes: a glass substrate (Glass Substrate) 1 on the bottom layer, a black matrix (BM, Black Matrix) 2 and a color resin layer (Color Layer) on the glass substrate 1; wherein the color resin is formed The layers of three primary color (RGB) resins, ie, red resin 3 , green resin 4 , and blue resin 5 ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/23G02F1/1335G03F7/00
Inventor 赵海玉梁晶晶
Owner BEIJING BOE OPTOELECTRONCIS TECH CO LTD
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