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Film coating material and preparation method thereof

A film layer and coating technology is applied in the field of preparation of the coating material, which can solve the problems of complex structure of the coating material, and achieve the effects of brilliant colors, high production efficiency and simple film layer.

Active Publication Date: 2010-01-20
BYD CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to overcome the defects of the complex structure of the above-mentioned coating materials in the prior art, provide a coating material with a simple structure, and also provide a method for preparing the coating material with a relatively simple process

Method used

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Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0013] The preparation method of the coating material provided by the present invention comprises sequentially under the magnetron sputtering condition of forming the oxide film layer and the magnetron sputtering condition of forming the metal film layer, applying power on the magnetron target to make the magnetron target The target substance is sputtered and deposited on the transparent substrate to form an oxide film layer and a metal film layer plated on the transparent substrate in sequence.

[0014] Forming the above-mentioned film layer is carried out by using magnetron sputtering ion plating equipment, preferably using intermediate frequency magnetron sputtering ion plating equipment. The intermediate frequency magnetron sputtering ion plating equipment includes a vacuum chamber, a heating device, a workpiece frame, a magnetron target, a baffle plate, a ventilation device, and a water cooling system, and the transparent substrate to be coated is fixedly placed on the wor...

Embodiment 1

[0039] A window glass (GE, PMMAZK5BR-CLEA) of 7mm×5mm×0.8mm was used as the transparent substrate, and the target material was a titanium target with a purity of 99.99%.

[0040] 1. Cleaning and activation

[0041] Put the cleaned and dried transparent substrate into the vacuum chamber of the intermediate frequency magnetron sputtering ion plating equipment (Shenzhen Zhenhengchang Industrial Co., Ltd.), and turn on the vacuum pump to evacuate the vacuum chamber to 5.0×10 -2 Pa, the argon gas with a flow rate of 800 standard ml / min makes the vacuum degree in the vacuum chamber 2.0 Pa, applies a bias voltage of 700 volts, and adjusts the duty cycle to 50%. At this time, the transparent substrate Perform argon ion bombardment cleaning and activation for 8 minutes.

[0042] 2. Plating titanium dioxide film layer

[0043] Into the vacuum chamber, the oxygen flow rate of 250 standard ml / min is introduced, and the flow rate of argon is adjusted to be 100 standard ml / min, so that th...

Embodiment 2

[0049] The transparent substrate uses a 7mm×5mm×0.8mm quartz plate window, and the 5mm×3mm central part of the transparent substrate is covered with high-temperature adhesive tape. The used targets are aluminum targets and titanium targets with a purity of 99.99%.

[0050] 1. Cleaning and activation

[0051] Put the cleaned and dried transparent substrate into the vacuum chamber of the intermediate frequency magnetron sputtering ion plating equipment (Shenzhen Zhenhengchang Industrial Co., Ltd.), and turn on the vacuum pump to evacuate the vacuum chamber to 4.0×10 -2 Pa, the argon gas with a flow rate of 720 standard ml / min makes the vacuum degree in the vacuum chamber 1.8 Pa, applies a bias voltage of 600 volts, and adjusts the duty cycle to 50%. At this time, the transparent substrate Perform argon ion bombardment cleaning and activation for 8 minutes.

[0052] 2. Plating aluminum oxide film layer

[0053] Into the vacuum chamber, the flow rate is 240 standard milliliters ...

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Abstract

The invention provides a film coating material. The material comprises a transparent substrate and a film layer coated on the transparent substrate, wherein the film layer consists of an oxide film layer and a metal film layer, the oxide film layer is positioned between the transparent substrate and the metal film layer, and both the oxide film layer and the metal film layer are single layers. The invention also provides a preparation method for the film coating material. According to the film coating material provided by the invention, the film layer is simple and only consists of the oxide film layer and the metal film layer, and various color effects can be obtained through different matches of the oxide film layer and the metal film layer, so the film coating material has gorgeous color, strong metal texture and good binding force. And the preparation method for the film coating material has simple process so as to have high production efficiency.

Description

technical field [0001] The invention relates to a coating material, and also relates to a preparation method of the coating material. Background technique [0002] Window glass is one of the main accessories of electronic products such as mobile phones, MP3, MP4, digital cameras, video cameras and DVDs. At present, the coating method has been widely used to decorate the windows of electronic products, which can make electronic products obtain beautiful appearance decoration and better texture, thereby increasing the value of products. [0003] The usual coating method is to use physical vapor deposition for coating, and the method of magnetron sputtering ion plating is especially a good coating method, which can produce strong metal texture, good bonding force, wear resistance and durability on the substrate. Coating with excellent corrosion performance, and the thickness of the film layer is very thin, which does not affect the functions of high-end products or products wi...

Claims

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Application Information

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IPC IPC(8): B32B7/02B32B15/04C23C14/35C23C14/08C23C14/02C23C30/00
Inventor 郑程林郭丽芬宫清
Owner BYD CO LTD
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