Silicon core cleaning technique

A silicon core, clean technology, applied in the direction of crystal growth, post-processing details, post-processing, etc., can solve the problems of producing a large amount of nitrogen oxides, harming operators, affecting the environment, etc., to achieve cost saving, high cleaning accuracy, and cleaning effect Good results

Inactive Publication Date: 2010-03-03
无锡中彩科技有限公司
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Problems solved by technology

The disadvantage of this cleaning method is that a large amount of nitrogen oxides will be produced during the treatment process, which will affect the surrounding environment, and it needs to invest in environmental protection equipment to deal with it. In addition, the existing technology is completely manual operation, which is harmful to the operator cause certain harm

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  • Silicon core cleaning technique

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Embodiment Construction

[0016] The present invention will be further described below in conjunction with specific drawings and embodiments.

[0017] a. Silicon core pretreatment: select a silicon core with a length of 2000 mm to 2600 mm and a thickness of 8 to 12 mm. First, use a soft object to dip a small amount (preferably wet gauze) of absolute ethanol to wipe off the impurities on the surface of the silicon core. Acetone wipes off the oil on the surface of the silicon core, and then puts the silicon core in an ultrasonic cleaning device for ultrasonic cleaning and drying;

[0018] b. Cleaning: Install the silicon core graphite fixture vertically in a closed reaction vessel, and the following reaction occurs at a temperature of 300-320°C: Si+3HCl→SiHCl 3 +H 2 , while corroding the surface layer of the silicon core, remove the oxide layer and metal impurities on the surface of the silicon core;

[0019] In the above reaction process, the mixed gas of hydrogen and hydrogen chloride is passed into ...

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Abstract

The invention discloses a silicon core cleaning technique, and relates to a processing technique of polysilicon, in particular to a method for cleaning silicone core. According to the technical schemeprovided by the invention, the silicon core cleaning technique comprises the following steps: a, silicon core pretreatment: firstly using anhydrous ethyl alcohol to wipe off the impurities on the surface of the silicon core, and then using acetone to wipe off oil stains on the surface of the silicon core; then putting the silicon core in an ultrasonic cleaning instrument for ultrasonic cleaning;and carrying out vacuum drying; b, cleaning: putting the cleaned silicon core in a closed reaction vessel, carrying out the following reaction under the temperature of 300 DEG C to 320 DEG C: Si+3HC-SiHCl3+H2; in the reaction process, introducing the mixed gas of hydrogen and hydrogen chloride into the reaction vessel; and c, repeated utilization of tail gas: adopting the reaction product of hydrogen trichloride and hydrogen as raw materials for preparing polysilicon, carrying out gas returning of the reaction product by a gas inlet pipe and a gas outlet pipe, and entering working section of reduction by a pipeline. The reaction product can be completely recovered, thus realizing zero emission of nitride and improving environment.

Description

technical field [0001] The invention relates to a polysilicon processing technology, in particular to a method for cleaning silicon cores. Background technique [0002] The surface of the silicon core must be cleaned before it can be used. In the prior art, the cleaning method of the surface of the silicon core is usually: Si is dissolved in a mixed acid of nitric acid and hydrofluoric acid to undergo a chemical reaction, and the reaction equation is as follows: [0003] 3Si+4HNO 3 +18HF→3H 2 SiF 6 +4NO+8H 2 O, in order to achieve the purpose of cleansing. The disadvantage of this cleaning method is that a large amount of nitrogen oxides will be produced during the treatment process, which will affect the surrounding environment, and it needs to invest in environmental protection equipment to deal with it. In addition, the existing technology is completely manual operation, which is harmful to the operator cause certain harm. Contents of the invention [0004] The o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/12C23F1/12
Inventor 周大荣王军高欢
Owner 无锡中彩科技有限公司
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