55results about How to "Improve cleaning accuracy" patented technology

The invention embodiment discloses a defense method, a device and a system for the DDos attack, which relate to the network technology and aim to solve the problem of low cleaning accuracy caused by the cleaning of the unidirectional data flow obtained by the network cleaning device found in the prior art. The defense method of the DDos attack in the invention embodiment includes that the data flow in the network is acquired and detected to obtain the attack information; the upstream data flow in the network is acquired and filtered to obtain the upstream data information of the protected host; the downstream data flow with the target of the protected host is processed with conduction, supplement and cleaning according to the attack information and the upstream data flow from the protected host. The invention embodiment also provides a measurement-control device, a cleaning device and a defense system for the DDos attack. The defense method, the device and the system for the DDos attack are applicable to the detection and defense of the DDos attack in the network technology.

A wafer W is processed by supplying a two-fluid, high pressure jet water, or mega-sonic water onto the wafer W, while rotating the wafer W in an essentially horizontal state. After supply of the cleaning fluid is stopped, the wafer W is dried by rotating the wafer W at a higher speed than that used in supplying the cleaning fluid. No rinsing process using purified water is performed in a period after stopping supply of the cleaning fluid and before rotating the substrate at the higher speed.

The invention discloses a silicon core cleaning technique, and relates to a processing technique of polysilicon, in particular to a method for cleaning silicone core. According to the technical schemeprovided by the invention, the silicon core cleaning technique comprises the following steps: a, silicon core pretreatment: firstly using anhydrous ethyl alcohol to wipe off the impurities on the surface of the silicon core, and then using acetone to wipe off oil stains on the surface of the silicon core; then putting the silicon core in an ultrasonic cleaning instrument for ultrasonic cleaning;and carrying out vacuum drying; b, cleaning: putting the cleaned silicon core in a closed reaction vessel, carrying out the following reaction under the temperature of 300 DEG C to 320 DEG C: Si+3HC-SiHCl3+H2; in the reaction process, introducing the mixed gas of hydrogen and hydrogen chloride into the reaction vessel; and c, repeated utilization of tail gas: adopting the reaction product of hydrogen trichloride and hydrogen as raw materials for preparing polysilicon, carrying out gas returning of the reaction product by a gas inlet pipe and a gas outlet pipe, and entering working section of reduction by a pipeline. The reaction product can be completely recovered, thus realizing zero emission of nitride and improving environment.

The invention relates to a laser cleaning device based on a flexible optical path. The laser cleaning device comprises a laser, a mechanical arm, a light guide arm and a scanning mechanism, wherein the light guide arm is fixedly connected on the mechanical arm, and can move along with the mechanical arm; the laser is arranged close to one end of the light guide arm; the scanning mechanism is arranged close to the other end of the light guide arm; laser projected from the laser enters the light guide arm from an incident end of the light guide arm and enters the scanning mechanism after being projected from an emergent end of the light guide arm; the scanning mechanism can perform two-dimensional rotation; and the direction of laser entering the scanning mechanism is adjusted, laser penetrates through the scanning mechanism to scan a cleaning part, and cleaning is completed. According to the laser cleaning device, the mechanical arm and the light guide arm are combined, the light guide arm can freely rotate at all angles along with the mechanical arm, a traditional hard optical path is changed into the flexible optical path, flexibility of the device is greatly improved, and automatic control is facilitated.

The invention provides an automatic detection and cleaning system of a redundant substance of a liquid rocket engine pipeline. The system mainly comprises an ultrasonic cleaning device, a particulate matter detection device, a signal acqusition device and an industrial control computer, wherein the ultrasonic cleaning device comprises a liquid holding tank, a liquid inlet pipe, a cleaning tank, a liquid level meter, an ultrasonic generator, a drainage pipe and a liquid collection tank; the cleaning tank is communicated with the liquid holding tank through the liquid inlet pipe and is communicated with the liquid collection tank through the drainage pipe; the liquid level meter and the ultrasonic generator are positioned in the cleaning tank; the particulate matter detection device is communicated with the liquid collection tank; the signal acqusition device comprises a microprocessor, a communication module, a signal acqusition module and a relay module; the industrial control computer is used for transmitting a turn-on and turn-off control signal to the microprocessor through the communication module and receiving and displaying liquid level information and particle matter information.

The invention relates to a method for cleaning an insulating oil sample bottle and a utilized cleaning device. The insulating oil sample bottle cleaning method comprises the steps of (1) ultrasonic decontamination: before work, preheating water to a suitable temperature firstly, adding laundry powder, placing an oil sample bottle in a cleaning basket which is then placed in a cleaning tank, rotating the cleaning basket to enable the oil sample bottle to be filled with a cleaning solution, and starting a decontamination ultrasonic generator for the decontamination; and (2) ultrasonic rinse: opening a blowdown valve after the decontamination cleaning is finished, cleaning the cleaning tank appropriately after the cleaning solution is discharged completely, closing the valve, opening a water inlet valve, opening the ultrasonic generator, heating the water to a suitable temperature, placing the oil sample bottle into the water for rinse, and after the oil sample bottle is rinsed cleanly, taking the bottle out of a vessel and performing draining separation. The method for cleaning the insulating oil sample bottle and the utilized cleaning device have the advantages as follows: (1) the cleaning speed is high, the cleaning effect is good, the cleanliness is high, and the damage to the surface of a workpiece is prevented; (2) hands of a worker are not contacted with the cleaning solution, and deep holes, thin seams and hidden positions of the workpiece can also be cleaned up safely and reliably; and (3), the cleaning precision is high, and tiny stain particles can be cleaned powerfully.

The invention relates to silicon wafer CMP post-processing equipment and a processing flow. The silicon wafer CMP post-processing equipment comprises an ozone water tank and a pure water flushing tank, wherein the ozone water tank and the pure water flushing tank are located at the rear ends of a plurality of CMP processing devices; a mechanical arm; a CMP post-cleaning device, wherein a water tank for placing a silicon wafer storage box is arranged at the front end of the CMP post-cleaning device. The processing method comprises the following steps: 1, processing silicon wafers by the CMP processing devices, and putting the silicon wafers into the silicon wafer storage box located in the ozone water tank of the CMP processing devices; 2, putting the silicon wafer storage box at the firststep in the pure water flushing tank for flushing; 3, delivering the silicon wafer storage box in the pure water flushing tank at the rear ends of the CMP processing devices to the water tank at the front end of the CMP post-cleaning device through the mechanical arm; 4, cleaning the silicon wafers in the silicon wafer storage box in the water tank one by one by the CMP post-cleaning device by using a CMP post-cleaning process. The method has the following advantages: (1) the silicon wafers are in a wet state in the whole process, and the cleaning precision of the silicon wafers is high; (2) the cleaning process effect of the silicon wafers after CMP is good.

The invention discloses an image testing method and device, a storage medium and an electronic device. The method comprises the following steps: acquiring a scene picture in a virtual scene presentedby a human-computer interaction client as a target image to be tested; inputting the target image into a target pixel semantic network model, wherein the target pixel semantic network model is a neural network model used for conducting semantic description processing on pixel states of all pixel points in the image and obtained after machine training is conducted through multiple sample images andpixel state data configured for the multiple sample images; acquiring target pixel state data output by the target pixel semantic network model; and inputting the target pixel state data into a testmodel to obtain a test result, the test model being used for performing a performance test on the human-computer interaction client. The technical problem that the test result is low in accuracy afterthe image test method provided by the related technology is adopted is solved.

The invention discloses a coating method for products, including glasses, based on plastic or nylon products. The coating method includes the following steps that the products are prepared and subjected to ultrasonic degreasing cleaning, ultrasonic deoiling cleaning and ultrasonic pure water cleaning; the cleaned products are dried and placed into a vacuum machine for film coating; the interior of the vacuum machine is vacuumized, and bombardment cleaning is carried out through direct current magnetron sputtering or medium-frequency magnetron sputtering or multi-arc magnetron sputtering; and reaction gas required for coating forming is added according to needs, and a target is used for conducting target sputtering on the products to form coatings. According to the coating method, ultrasonic cleaning is additionally adopted, the products are treated before being coated, balanced contact at multiple angles can be achieved, and cleaning precision is improved; multiple types of magnetron sputtering are adopted for bombardment cleaning, the surfaces of the products can be effectively cleaned before coating, and thus the products can be combined with the coatings more effectively; and in the coating environment, inert gas is injected continuously to control the vacuum degree and add the gas required for coating, and thus the required coating effect of the coatings is achieved.

The invention relates to the field of laser cleaning equipment, in particular to an underwater laser cleaning device for ship. The device is arranged for ship cleaning, can directly conduct laser cleaning on the bottom of a ship located in water and is high in automation degree. The ship underwater laser cleaning device comprises two floating devices, two lifting devices and a cleaning base, the upper ends of the lifting devices are connected with the floating devices, the cleaning base is arranged between the two lifting devices and connected with the lower ends of the lifting devices, and the floating devices are provided with laser generators. The cleaning base is provided with a laser head, and the laser generator is connected with the laser head through an optical fiber. The floatingdevices directly float on the water surface, the cleaning base is suspended in water through the lifting device,s and laser cleaning can be directly conducted on the bottom of a ship.

The invention belongs to the technical field of steel rust removing devices and discloses a handheld type laser cleaning machine and a contaminant removing method. Laser parameters are adjusted, the energy density of plasmas is controlled to be higher than a first threshold value and lower than a second threshold value, and a contaminated layer or an oxide layer is removed; a second threshold value about the plasmas exists; according to the surface contamination degree of the contaminated layer, the number of times of pulse is selected to clean the surface of the contaminated layer. The handheld type laser cleaning machine is free of grinding, adopts noncontact type cleaning and avoids secondary pollution; the handheld type laser cleaning machine is high in cleaning precision, high in controllability, free of consumables and high in environmental protection performance; due to the handheld type, operation and control are easy, and the handheld type laser cleaning machine can operate just by being electrified; the handheld type laser cleaning machine is high in cleaning efficiency, saves time, stable in system and long in service life; the handheld type laser cleaning machine does not influence the steel, and even surface characters, bolts and other corners can be cleaned up; by means of switching through a functional button on a laser generator, the handheld type laser cleaningmachine can be converted to achieve the function of cutting thin plates.

The invention relates to the technical field of smart home, and discloses a cleaning control method, device and system and a storage medium, which are used for controlling each water spraying point to perform water spraying operation according to a real-time relative position relationship between a scraper blade and each water spraying point, improving the cleaning accuracy and reducing the waste of water resources. The cleaning control method comprises the steps that when it is detected that a mobile robot advances to a preset position of a base station, the scraper blade is reset to a reference initial position, and the reference initial position is located at a first end point of a scraper blade track in the base station; the scraper blade is controlled to reciprocate once along the scraper blade track, and the water spraying points on the two sides of the scraper blade track are controlled to spray water according to the real-time relative position relation between the scraper blade and the water spraying points in the reciprocating process; and when the scraper blade returns to the reference initial position from the second end point of the scraper track, 1 is added to the cleaning times, and the initial value of the cleaning times is a preset value.

The invention discloses a glass cleaning robot and a cleaning method and belongs to the field of unmanned aerial vehicle control. The cleaning robot comprises an unmanned aerial vehicle, a mooring rope and a ground trolley; the unmanned aerial vehicle comprises a cleaning reaction force adjusting device, a telescopic long rod device, a steering device and the like; the telescopic long rod device comprises a telescopic adjustable long rod and is used for driving the cleaning device to move back and forth along with the telescopic adjustment of the long rod; the steering device comprises a fixing base and a rotating body and is used for driving the cleaning device to rotate leftwards and rightwards along with rotating adjustment of the rotating body; the cleaning reaction force adjusting device is connected with the other end of the telescopic long rod device and used for generating a pair of reaction forces acting on the unmanned aerial vehicle when the cleaning device sprays liquid; the mooring rope is used for conveying power supply power of the unmanned aerial vehicle, transmitting a control signal and conveying cleaning water and cleaning liquid for cleaning; the ground trolleyis used for generating the control signal and storing the cleaning liquid. The glass cleaning robot of the invention has the advantages of low power and wide application range.

The present invention relates to the technical field of modern agricultural machinery industry and discloses a potato washing device. The potato washing device comprises a box body, a material inlet,a material outlet, a power box, a water tank and a water conveying pipe; a left side of an inside of the box body is provided with a transverse mud removing cylinder, a right side of the mud removingcylinder is provided with a flushing pipeline, a bottom end of the material inlet communicates with a material conveying pipeline, a rear end of the material conveying pipeline communicates with a center of a left side of the mud removing cylinder, a group of rotary cylinders which are coaxial with the mud removing cylinder are arranged in the mud removing cylinder, a right end part of the mud removing cylinder communicates with the flushing pipeline downwards, two groups of water spray heads are arranged in the front end, middle end and rear end of the flushing pipeline, outer ends of the water spray heads communicate with a booster pump, and the booster pump communicates with a water tank fixed on an upper surface of the flushing pipeline through a water conveying pipe; and a second conveying belt is arranged right below the rear end of the flushing pipeline. Advantages are as follows: the potato washing device is high in washing precision, conducts continuous transportation and washing, and is suitable for large-scale potato washing and use.