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Wavelength irrelevant fused quartz transmission polarization beam-splitting grating

A fused silica, polarization beam splitting technology, applied in directions such as diffraction gratings

Inactive Publication Date: 2010-06-16
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Moharam et al. have given the algorithm of strict coupled wave theory [Prior Art 1: M.G.Moharam et al., J.Opt.Soc.Am.A.12, 1077(1995)], which can solve this kind of high-density grating diffraction problem, but this method can only calculate the corresponding diffraction efficiency for a single wavelength
To the best of our knowledge, no one has so far given the design parameters for a wavelength-independent deep-etched fused silica transmission polarization beamsplitter grating in the UV to NIR band from 300 nm to 1800 nm

Method used

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  • Wavelength irrelevant fused quartz transmission polarization beam-splitting grating
  • Wavelength irrelevant fused quartz transmission polarization beam-splitting grating
  • Wavelength irrelevant fused quartz transmission polarization beam-splitting grating

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Embodiment Construction

[0017] Using micro-optical technology to fabricate high-density deep-etched rectangular gratings, first deposit a layer of metal chromium film on a dry and clean fused silica substrate, and evenly coat a layer of positive photoresist on the chromium film (Shipley, S1818, USA) . Then the grating is recorded by holographic recording, developed, and then the photoresist pattern is transferred from the photoresist to the chrome film with a chrome removal solution, and the excess photoresist is removed by chemical reagents. Finally, put the sample into an inductively coupled plasma etching machine for a certain period of plasma etching, transfer the grating to the fused silica substrate, and then remove the remaining chromium film with a chromium-removing solution to obtain high-density deep etching Fused silica grating with surface relief structure.

[0018] In the process of making the grating, under different incident wave conditions, the corresponding fused silica transmission...

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Abstract

The invention relates to a wavelength irrelevant fused quartz transmission polarization beam-splitting grating used for ultraviolet to near-infrared wave bands with wavelength ranging from 300 nanometers to 1800 nanometers. The grating is characterized in that incidence conditions and uniformized structure parameters are not changed with wavelength. The uniformized structure parameters are as follows: the dutyfactor of the grating is 0.5, the ratio of incident wavelength to the grating period ranges from 1.74 to 1.75, the ratio of etched depth to the grating period ranges from 2.21 to 2.22, and the grating has extremely high transmission efficiency and polarization extinction ratio in the wave bands. In the practice of production, the wavelength irrelevant fused quartz transmission polarization beam-splitting grating can be processed by the optical holography recording technique or an electron beam write-through device combined with the micro-electronic deep etching process and has the advantages of mature process, low manufacturing cost, mass production and important practical prospect.

Description

technical field [0001] The invention relates to a polarization beam-splitting grating, in particular to a wavelength-independent fused silica transmission polarization beam-splitting grating in the ultraviolet to near-infrared band. Background technique [0002] Gratings are widely used in various optical systems, and one of the important uses is as a beam splitting device in holographic systems, optical information processing systems and measurement systems. Traditional beam splitters based on multi-layer dielectric films have large energy losses, complex manufacturing processes, and high costs. Photonic crystals, which have emerged in recent years as beam splitters, also have disadvantages such as high cost and difficult manufacture. Fused silica is a very good optical material. It has a wide transmission spectrum from deep ultraviolet to far infrared, high optical quality, good temperature stability, high laser damage threshold, and small dispersion coefficient. Using f...

Claims

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Application Information

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IPC IPC(8): G02B5/18
Inventor 周常河吕鹏冯吉军
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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