Wavelength irrelevant fused quartz transmission polarization beam-splitting grating
A fused silica, polarization beam splitting technology, applied in directions such as diffraction gratings
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[0017] Using micro-optical technology to fabricate high-density deep-etched rectangular gratings, first deposit a layer of metal chromium film on a dry and clean fused silica substrate, and evenly coat a layer of positive photoresist on the chromium film (Shipley, S1818, USA) . Then the grating is recorded by holographic recording, developed, and then the photoresist pattern is transferred from the photoresist to the chrome film with a chrome removal solution, and the excess photoresist is removed by chemical reagents. Finally, put the sample into an inductively coupled plasma etching machine for a certain period of plasma etching, transfer the grating to the fused silica substrate, and then remove the remaining chromium film with a chromium-removing solution to obtain high-density deep etching Fused silica grating with surface relief structure.
[0018] In the process of making the grating, under different incident wave conditions, the corresponding fused silica transmission...
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