Laser scanning scattering detection and classification system for silicon slice surface defects
A technology of silicon wafer surface, laser scanning, applied in scattering characteristic measurement, optical test defect/defect, optics, etc., can solve the problem of production line yield decline, etc., to achieve the effect of improving working voltage, good reliability and improving sensitivity
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[0017] The preferred embodiments of the present invention are given below in conjunction with the accompanying drawings to illustrate the technical solutions of the present invention in detail. Such as figure 1 The schematic diagram of the principle of the laser scanning scattering detection and classification system for the surface defects of the silicon wafer is also a schematic diagram of the structure of the best embodiment of the present invention. As can be seen from the figure, the structure of the system includes: the light beam emitted by the laser light source assembly 1 advances In the direction of the Faraday isolator 2, the double-concave lens 3 and the first plano-convex lens 4, the beam expander system, the double cemented focusing lens 5, the beam is deflected by the plane mirror 6 and obliquely focused and incident on the surface of the measured silicon wafer 7 , The silicon wafer 7 is located on the worktable 15; the scattered light on the surface of the silic...
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