Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Optical sensor for large flow full semiconductor dust particle counter

A particle counter and optical sensor technology, applied in the field of optical sensors, to achieve the effects of increased amplitude, favorable test optimization and adjustment, and low price

Inactive Publication Date: 2011-12-07
NANJING UNIV OF SCI & TECH
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But the above-mentioned patent has the following disadvantages: although the photomultiplier tube used has a fast response speed, it is bulky, which is not conducive to the miniaturization of the optical sensor, making it difficult to miniaturize the whole machine; At the same time, the use of photomultiplier tubes requires high-voltage power supply and its own shot noise, which affects the optimization and improvement of the signal-to-noise ratio of the instrument; the low-power lasers used, due to the low-power laser signal amplitude in large flow environments It is easy to miss counting, the signal-to-noise ratio is low, and the counting efficiency is low; after the laser is focused on the photosensitive area, the illumination light is not fully utilized, and the counting efficiency is damaged

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Optical sensor for large flow full semiconductor dust particle counter
  • Optical sensor for large flow full semiconductor dust particle counter
  • Optical sensor for large flow full semiconductor dust particle counter

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0011] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0012] combine figure 1 , figure 2 It can be seen that the optical sensor of the new large-flow all-semiconductor dust particle counter of the present invention is a right-angle scattering optical system, including an illumination system, a scattered light collection system, an air system and a pre-adjustable amplifier circuit. The illumination system consists of a semiconductor laser 1, an aspheric mirror 2, a first entrance aperture 3, a second entrance aperture 4, an exit aperture 7, and an optical trap 8. The first entrance aperture 3 and the second entrance aperture 4 are placed on In front of the photosensitive area 5, the exit diaphragm 7 is placed behind the photosensitive area 5; the light source 1 adopts a high-power semiconductor laser light source greater than or equal to 100mW, and emits divergent beams that are two-dimensionally focused by th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an optical sensor for a large-flow all-semiconductor new type dust particle counter. In the forward direction of the light beam emitted by the semiconductor laser light source, an aspheric mirror, an incident aperture, an exit aperture and an optical trap are arranged in sequence, perpendicular to the optical path. A spherical reflector, a bell-mouth-type blocking diaphragm, and a photodetector are arranged on the top, and the positions of the photosensitive area and the photosensitive surface of the photodetector are respectively located on both sides of the spherical center of the spherical reflector, and satisfy the object-image relationship of geometric optics. A high-power semiconductor laser light source is used, a photodiode is used as a photodetector, and a gain-adjustable preamplifier circuit is placed on the shell behind the photodetector. The invention improves the counting efficiency, increases the counting efficiency and particle size resolution of the instrument; the instrument has a long service life and good interchangeability between instruments; and the power consumption is low, the price is low, and the small volume is conducive to the miniaturization development of the whole machine.

Description

technical field [0001] The invention belongs to cleanliness detection equipment, in particular to an optical sensor for a full-semiconductor dust particle counter with miniaturization, large flow, high signal-to-noise ratio, high particle size resolution, and high counting efficiency. Background technique [0002] With the continuous improvement of people's requirements for air cleanliness, material purity and processing accuracy, the measurement technology of micro particles is particularly important. The dust particle counter is the main measuring instrument used in the light scattering counting method to measure the particle size distribution. The laser dust particle counter is based on the Mie scattering theory. The scattered light generated by a single particle in the illumination beam is the direct measurement object, and then the measuring instrument is used to distinguish the particle size of the particle to be measured according to the difference in the scattered l...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01N15/14
Inventor 王春勇闫振纲卞保民严伟
Owner NANJING UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products