Hypovanadic oxide-based composite film with adjustable radiance and preparation method thereof

A vanadium dioxide and composite thin film technology, applied in sputtering coating, vacuum evaporation coating, coating and other directions, can solve the problems of high emissivity at low temperature, excessive radiation heat dissipation, unfavorable heat preservation, etc. The effect of expanding the application range and suppressing the radiative heat exchange

Inactive Publication Date: 2010-09-01
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] Although the vanadium dioxide film can effectively control the infrared light transmittance, the emissivity of the low-temperature phase is still high, and the radiation heat dissipation is more, which is not conducive to heat preservation in winter
According to the literature (Valkonen, E.; Karlsson, B.; Ribbing, C.G. Solar Energy 1984, 32, 211), when the homogeneous metal film is changed into discontinuous metal nanoparticles, the metal nanoparticles will show low reflection, High absorption characteristics; and its metal nanoparticles realize localized absor

Method used

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  • Hypovanadic oxide-based composite film with adjustable radiance and preparation method thereof
  • Hypovanadic oxide-based composite film with adjustable radiance and preparation method thereof
  • Hypovanadic oxide-based composite film with adjustable radiance and preparation method thereof

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Effect test

Embodiment 1

[0044] 1) Depositing a vanadium dioxide film on a transparent substrate: depositing a vanadium dioxide film with a thickness of 40 nanometers on a transparent substrate.

[0045] 2) deposition of conductive metal film by sputtering;

[0046] Preparation of conductive metal film: place a quartz substrate deposited with a 40-nanometer-thick vanadium dioxide film in a sputtering chamber, vacuumize to 8.0 Pa, use a platinum metal material with a weight percentage of 99.5% as a target, and work in an atmosphere of It is high-purity argon gas, and the argon gas is injected into the sputtering chamber at a flow rate of 30 sccm and the pressure is maintained at 8.0 Pa, the sputtering current is set at 30 mA, and the sputtering time is 30 seconds to obtain a vanadium dioxide-based composite film, in which the conductive metal The thickness of the film was 13 nm.

[0047] Utilize the international standard GB / T 2680-94 measurement to know that the emissivity of gained vanadium dioxide-...

Embodiment 2

[0050] 1) Depositing a vanadium dioxide film on a transparent substrate: depositing a vanadium dioxide film with a thickness of 40 nanometers on a transparent substrate.

[0051] 2) deposition of conductive metal film by sputtering;

[0052] Preparation of conductive metal film: place a quartz substrate deposited with a 40-nanometer-thick vanadium dioxide film in a sputtering chamber, vacuumize to 8.0 Pa, use a platinum metal material with a weight percentage of 99.5% as a target, and work in an atmosphere of It is high-purity argon gas, the argon gas is injected into the sputtering chamber at a flow rate of 30 sccm and the air pressure is maintained at 8.0 Pa, the sputtering current is set at 30 mA, and the sputtering time is 15 seconds to obtain a vanadium dioxide-based composite film, in which the conductive metal The thickness of the film is 6 nm.

[0053] According to the measurement of the international standard GB / T 2680-94, it can be seen that the emissivity of the ob...

Embodiment 3

[0056] 1) Depositing a vanadium dioxide film on a transparent substrate: depositing a vanadium dioxide film with a thickness of 40 nanometers on a transparent substrate.

[0057] 2) deposition of conductive metal film by sputtering;

[0058] Preparation of conductive metal film: place a quartz substrate deposited with a 40-nanometer-thick vanadium dioxide film in a sputtering chamber, vacuumize to 8.0 Pa, use a platinum metal material with a weight percentage of 99.5% as a target, and work in an atmosphere of It is high-purity argon gas, and the argon gas is injected into the sputtering chamber at a flow rate of 30 sccm and the pressure is maintained at 8.0 Pa. The sputtering current is set at 30 mA, and the sputtering time is 45 seconds to obtain a vanadium dioxide-based composite film, in which the conductive metal film The thickness is 18 nm. According to the measurement of the international standard GB / T 2680-94, it can be seen that the emissivity of the obtained vanadium...

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Abstract

The invention discloses a hypovanadic oxide-based composite film with adjustable radiance and a preparation method thereof. The hypovanadic oxide-based composite film comprises a transparent underlay and a composite film; the composite film comprises a hypovanadic oxide film positioned on the underlay and a conductive metal film positioned on the hypovanadic oxide film; the composite film also comprises an inorganic transparent film; the thickness of the conductive metal film is between 2 and 30 nanometers; metal particles exist in a continuous particle form; and an inert transition layer is deposited on the transparent underlay. The preparation method disclosed by the invention has a simple process; and on the premise of keeping the thermochromism performance of the hypovanadic oxide, the obtained hypovanadic oxide-based composite film can effectively reduce the radiance of low-temperature phase thereof, is favorable for improving the thermal insulation performance of the low-temperature phase, and enlarges the application range of the hypovanadic oxide-based composite film serving as an energy-saving window.

Description

technical field [0001] The invention belongs to the field of inorganic energy-saving materials, and in particular relates to a vanadium dioxide-based composite thin film with adjustable emissivity and a preparation method thereof. Background technique [0002] my country is an energy-short country. The proportion of crude oil imports has reached 48.5% in 2008, and it is increasing year by year. The energy supply situation is tense. Among all kinds of energy consumption, building energy consumption accounts for 30% of the total energy consumption, and the energy consumption per unit building area is 2 to 3 times that of developed countries, resulting in serious energy waste. [0003] Glass consumes the most energy in buildings. The glass area accounts for about 15% of the building area, while the heat lost through ordinary glass reaches 70%. The reason is that ordinary glass does not have the ability to regulate light transmission. In summer, a large amount of near-infrared ...

Claims

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Application Information

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IPC IPC(8): C03C17/245C23C14/34
Inventor 高彦峰康利涛罗宏杰杜靖张宗涛
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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