Polarized point diffraction interferometer system for test of low-reflectivity optical spherical surfaces

A point-diffraction interference and surface shape detection technology, which is applied in the direction of optical devices, measuring devices, instruments, etc., can solve problems such as the difficulty of adjusting the ratio of interference fringes, and achieve a simple and feasible detection method, simple structure, and easy assembly. Effect

Inactive Publication Date: 2010-12-15
ZHEJIANG UNIV +1
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Problems solved by technology

[0005] The purpose of the present invention is to solve the problem that the existing pinhole point diffraction interferometer is difficult to realize the adjustable contrast of interference fringes, and to provide a polarization point diffraction interference system that can be used for low reflectivity optical spherical surface shape detection

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  • Polarized point diffraction interferometer system for test of low-reflectivity optical spherical surfaces
  • Polarized point diffraction interferometer system for test of low-reflectivity optical spherical surfaces
  • Polarized point diffraction interferometer system for test of low-reflectivity optical spherical surfaces

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Embodiment

[0027] In the embodiment, the measured spherical surface S7 is a spherical surface with a radius of curvature of 180 mm and a numerical aperture (NA) of 0.65. The linearly polarized laser S1 obtains linearly polarized light through the half-wave plate S2, and generates parallel light through the collimator beam expander system S3, which is converged to the diffraction mask S5 through the microscope objective lens S4 with a magnification of 20× and an NA of 0.4 On the diffraction pinhole, a more ideal diffraction spherical wavefront is obtained. in figure 2 The diffraction mask shown is made of quartz glass substrate S5a, on which a chromium metal reflective film S5b with a thickness of 200nm (refractive index corresponding to 632.8nm wavelength is 2.65+3i) is plated, and is etched by convergent ion beam etching method. (Focused Ion Beam Etching, FIBE) process a diffraction pinhole S5c with a relatively ideal circularity on the metal film layer, and its diameter is taken as 0...

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Abstract

The invention discloses a polarized point diffraction interferometry system for test of low-reflectivity optical spherical surfaces. As the reflectivity of the optical spherical surface is low in the actual polishing process, a high-precision interference test system needs to have the function of adjusting visibility of fringes to obtain the ideal visibility of interference fringes. The invention solves the problem of realizing adjusting the visibility of interference fringes while ensuring the test precision of the spherical surface. The invention is technically characterized by establishing the polarized point diffraction interferometer system capable of realizing adjusting the visibility of interference fringes by introducing a polarization optical element to adjust the polarization states of light beams based on a point diffraction interferometer system capable of realizing high-precision test; and putting forward corresponding structure design and system error correction methods by analyzing the function characteristics of each element in the interferometer system to realize high-precision test of the spherical surfaces. The invention provides a feasible method for high-precision test of the low-reflectivity optical spherical surfaces.

Description

technical field [0001] The invention relates to a polarization point diffraction interference system which can be used for detecting the surface shape of an optical spherical surface with low reflectivity. Background technique [0002] With the continuous improvement of optical imaging and optical processing requirements, higher requirements are put forward for the detection accuracy of optical surfaces such as spherical surfaces. In interferometric detection systems such as Fizeau interferometer and Tieman-Green interferometer, it is necessary to obtain a reference wavefront from an optical element with high surface shape accuracy, and then compare it with the detection wavefront containing the surface shape information to be measured. Thus, the surface shape data to be measured are obtained. Therefore, the surface shape accuracy of the reference element directly limits the detection accuracy that can be achieved by traditional interferometric systems. At present, some co...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/24
Inventor 杨甬英王道档刘东卓永模许嘉俊吴永前
Owner ZHEJIANG UNIV
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