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Method for producing trichlorosilane

A technology of trichlorosilane and hydrogen chloride, which is applied in the direction of halosilane and silicon halide compounds, can solve the problem of low conversion rate of trichlorosilane and silicon tetrachloride, and achieve the effect of high yield

Inactive Publication Date: 2012-07-18
洛阳晶辉新能源科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, there is a problem that the conversion rate of silicon tetrachloride is relatively low in the production of trichlorosilane by the above-mentioned reactor.

Method used

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  • Method for producing trichlorosilane
  • Method for producing trichlorosilane
  • Method for producing trichlorosilane

Examples

Experimental program
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Embodiment 1

[0050] This embodiment is used to illustrate the method for producing trichlorosilane provided by the present invention.

[0051] (1) use figure 1 The reactor shown, where the first partition g 1 and the second separator g 2 The first reaction zone in between is a fixed-bed reactor with a total height of 2m, a circular cross-section, and a diameter of 1m. There is a catalyst bed IV inside, and the height of the catalyst bed IV is 0.5m. The catalyst bed IV is made of 50Ni / 50SiO 2Catalyst (all catalysts in the embodiment of the invention are commercially available goods of Luoyang Jinghui New Energy Technology Co., Ltd., and its meaning is nickel powder and SiO 2 The weight ratio is 50:50) and silicon powder (metallurgical silicon, particle size: 40-120 mesh, purity more than 98%, the silicon powder used in the embodiment of the present invention is all this silicon powder), wherein catalyst and silicon powder The weight ratio is 1:0.2, the second opening b and the first part...

Embodiment 2

[0058] This embodiment is used to illustrate the method for producing trichlorosilane provided by the present invention.

[0059] Adopt the reactor shown in Fig. (2), produce trichlorosilane according to the method for embodiment 1, difference is, catalyst bed layer IV is made of 50CuCl / 50SiO 2 Catalyst (its meaning is cuprous chloride and SiO 2 The weight ratio is 50:50) and silicon powder, wherein the weight ratio of catalyst to silicon powder is 1:0.1, preheated SiCl 4 and H 2 The molar ratio is 1:2, the temperature in the first reaction zone is 450°C, the pressure is 1.0MPa, and the contact time is 100s; the second reaction zone is a fluidized bed reactor, located above the first reaction zone, with a total height of 3m , the cross section is circular, the diameter is 0.5m, the third opening c and the second partition g 2 The distance between them is 0.8m, the temperature in the second reaction zone is 280°C, the pressure is 0.5MPa, the contact time is 10s, and the mola...

Embodiment 3

[0062] This embodiment is used to illustrate the method for producing trichlorosilane provided by the present invention.

[0063] Produce trichlorosilane according to the method of embodiment 1, the difference is that the preheated SiCl 4 and H 2 The molar ratio of catalyst and silicon powder is 1:6, the weight ratio of catalyst and silicon powder is 1:0.25, the temperature in the first reaction zone is 550°C, the pressure is 1.5MPa, and the contact time is 50s; the temperature in the second reaction zone is 320°C , the pressure is 1.5MPa, and the contact time is 15s.

[0064] Calculate the conversion rate of silicon tetrachloride, listed in Table 1

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Abstract

The invention provides a method for producing trichlorosilane, which is characterized by comprising the following steps: (1) contacting silicon tetrachloride with hydrogen in a first reaction region in the presence of catalyst to obtain a first gas mixture containing the trichlorosilane, the silicon tetrachloride and hydrogen chloride; and (2) contacting the first gas mixture with silica powder in a second reaction region to obtain a second gas mixture containing the trichlorosilane and the silicon tetrachloride; and separating the second gas mixture to obtain the trichlorosilane. In the method provided by the invention, the silica powder and the silicon tetrachloride are respectively injected into the different reaction regions, the reaction depth of each reaction region is respectively controlled, and the trichlorosilane with high yield and high quality at the condition of not increasing the catalyst usage can be obtained.

Description

technical field [0001] The present invention relates to a method for producing trichlorosilane. Background technique [0002] At present, the improved Siemens method is the mainstream process for polysilicon production at home and abroad. Silicon tetrachloride and hydrogen chloride are the main by-products of polysilicon production in this process. Every ton of polysilicon produced will produce more than 10 tons of silicon tetrachloride and about 1-5 tons of hydrogen chloride. Since there is no large-scale, efficient and safe digestion and treatment of SiCl produced in the process of producing polysilicon 4 The method has caused a large amount of hoarding of high-content chlorine compounds, which has brought great hidden dangers to environmental safety. [0003] In recent years, silicon tetrachloride hydrogenation technology has been recognized by more and more people as an effective way to effectively solve the by-product and pollution problems of the polysilicon industr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/107
Inventor 任延涛周冬松张晓昕罗一斌舒兴田
Owner 洛阳晶辉新能源科技有限公司
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