Multi-stage depressed collector material and preparation and surface treatment method thereof

A technology for surface treatment and collector, which is applied in the field of satellite traveling wave tube multi-stage step-down collector material and its preparation and surface treatment, which can solve the problems of low strength and difficult to guarantee the insulation performance of collector.

Inactive Publication Date: 2011-02-02
INST OF ELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Due to the loose structure and low strength of graphite materials, it is easy to generate graphite dust under the l...

Method used

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  • Multi-stage depressed collector material and preparation and surface treatment method thereof
  • Multi-stage depressed collector material and preparation and surface treatment method thereof
  • Multi-stage depressed collector material and preparation and surface treatment method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0074] 1. Using W and Cu as raw materials, the average particle size of W and Cu powder after bleaching treatment is 5-8 μm, and the volume ratio of W and Cu powder is formulated according to 45:55;

[0075] 2. Isostatic pressing after dry ball milling, molding pressure 200MPa;

[0076] 3. Sintering temperature: 1150±50°C, heat preservation for 4 hours to obtain a sintered body with a density greater than 95%;

[0077] 4. After ultrasonically cleaning and drying the sintered body with acetone, soak it in the chromic acid solution for 20-50 seconds and take it out;

[0078] 5. Deacidification and dehydration treatment: Soak the sample treated with chromic acid solution in distilled water and boil for 5-8 minutes. Repeat wash 3 times. Then dehydrate with acetone and dry.

[0079] 6. Hydrogen treatment: 950±20°C, duration 15-40 minutes, hydrogen dew point not higher than -35°C.

[0080] After processing by the process of the method of the present invention, the surface morpho...

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Abstract

The invention discloses a multi-stage depressed collector material and preparation and a surface treatment method thereof, which relates to a vacuum electronic technology and is a novel microporous electrode material which can be used for a multi-stage depressed collector of a satellite traveling-wave tube and a treatment process thereof. The electrode material has a micron/submicron-level microporous structure and is beneficial to inhibiting secondary electron emission and improving the recovery efficiency of the multi-stage depressed collector, thereby improving the overall efficiency of the traveling-wave tube. The method has the advantages of simple and controllable process and low cost. Compared with the surface modified by ion beams, the electrode surface of the prepared multi-stage depressed collector has the same effect on inhibiting secondary electron emission.

Description

technical field [0001] The invention relates to the technical field of vacuum electronics, and relates to a satellite traveling wave tube multi-stage step-down collector material and a preparation and surface treatment method thereof. Background technique [0002] As the final power amplifier, the satellite traveling wave tube is widely used in communication, navigation and positioning, military surveying and mapping, microwave remote sensing, electronic reconnaissance, data transmission and other payload technologies, and is the core component of the satellite. [0003] As a traveling wave tube for satellites, high efficiency is one of its core technical indicators. The efficiency of a traveling wave tube is mainly determined by the electron efficiency and the recovery efficiency of the collector. After the electronic efficiency reaches a certain limit, it is difficult to further improve it. At this time, the improvement of the efficiency mainly depends on the recovery eff...

Claims

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Application Information

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IPC IPC(8): C23F1/18H01J23/027C22C1/08H01J25/34C23F1/34H01J9/14C23G1/10
Inventor 赵世柯樊会明肖东梅邓峰苏小保
Owner INST OF ELECTRONICS CHINESE ACAD OF SCI
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