Method for preparing GaN base LED (Light Emitting Diode)
An LED epitaxial wafer, p-gan technology, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of difficult removal, low light extraction efficiency of GaN-based LEDs, etc., to achieve short time consumption, improved heat dissipation and light extraction efficiency, Simple and easy to achieve
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[0015] The method for preparing a GaN-based LED of the present invention specifically includes the following steps:
[0016] (1) GaN-based LED epitaxial wafers are grown on SiC substrates by conventional metal-organic chemical vapor deposition (MOCVD). The structure of the grown GaN-based LED epitaxial wafers is as follows: figure 1 As shown, from top to bottom are SiC substrate, N-GaN layer, quantum well active region and P-GaN layer.
[0017] (2) Clean the surface of the P-GaN layer with an organic or inorganic solvent, and remove the surface oxide layer by acid solution, and make an ohmic contact layer and a mirror layer, an ohmic contact layer and a mirror layer on the treated P-GaN layer in sequence The layers are bonded together as bonding layers. Such as figure 1 As shown, the bonding layer is bonded to a conductive Si or Cu substrate.
[0018] (3) Thin the SiC substrate to a thickness of 25 μm-35 μm by conventional mechanical wear reduction, such as figure 1 shown;...
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