Check patentability & draft patents in minutes with Patsnap Eureka AI!

Method for preparing GaN base LED (Light Emitting Diode)

An LED epitaxial wafer, p-gan technology, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of difficult removal, low light extraction efficiency of GaN-based LEDs, etc., to achieve short time consumption, improved heat dissipation and light extraction efficiency, Simple and easy to achieve

Inactive Publication Date: 2011-03-30
Shandong Huaguang Optoelectronics Co. Ltd.
View PDF6 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Aiming at the problems of low light extraction efficiency of GaN-based LEDs on SiC substrates and difficulty in removing SiC substrates by wet and dry methods, the present invention provides a SiC substrate stripping removal that is simple and easy to implement, and can improve LED light extraction efficiency after stripping SiC Method for preparing GaN-based LEDs

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing GaN base LED (Light Emitting Diode)
  • Method for preparing GaN base LED (Light Emitting Diode)
  • Method for preparing GaN base LED (Light Emitting Diode)

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0015] The method for preparing a GaN-based LED of the present invention specifically includes the following steps:

[0016] (1) GaN-based LED epitaxial wafers are grown on SiC substrates by conventional metal-organic chemical vapor deposition (MOCVD). The structure of the grown GaN-based LED epitaxial wafers is as follows: figure 1 As shown, from top to bottom are SiC substrate, N-GaN layer, quantum well active region and P-GaN layer.

[0017] (2) Clean the surface of the P-GaN layer with an organic or inorganic solvent, and remove the surface oxide layer by acid solution, and make an ohmic contact layer and a mirror layer, an ohmic contact layer and a mirror layer on the treated P-GaN layer in sequence The layers are bonded together as bonding layers. Such as figure 1 As shown, the bonding layer is bonded to a conductive Si or Cu substrate.

[0018] (3) Thin the SiC substrate to a thickness of 25 μm-35 μm by conventional mechanical wear reduction, such as figure 1 shown;...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for preparing a GaN base LED (Light Emitting Diode), which comprises the following steps of: firstly, growing a GaN base LED epitaxial wafer on an oSiC substrate according to a conventional process; cleaning and removing grease and an oxide layer from the surface of the P-GaN layer; then, preparing a bonding layer on the P-GaN layer; bonding the bonding layer on the Si or Cu substrate; reducing the thickness of the SiC substrate into a range between 25mum and 35mum by a mechanical reducing and grinding mode; then, cutting the SiC substrate into a lattice structure by adopting a laser cutting mode, wherein the cutting depth reaches the inside of the N-GaN layer; then, soaking the SiC substrate into a corroding liquid for corroding the N-GaN layer at the interface part so that the SiC substrate separated into single blocks on the N-GaN layer is disconnected from the N-GaN layer. The method for preparing the GaN base LED is simple and can be easily realized, the influence on the performance of devices is small in the whole process, the advantage of high-quality GaN crystal growing on the SiC substrate can be ensured, meanwhile, the N-GaN surface with the peeled SiC substrate has the coarsening effect, and the heat radiation and the light taking efficiency of the made LED devices can be improved.

Description

technical field [0001] The invention relates to a preparation method of a GaN-based LED with a vertical structure, belonging to the technical field of optoelectronic devices. Background technique [0002] In the early 1990s, the third-generation wide-bandgap semiconductor materials represented by nitrides made a historic breakthrough, and green, blue and purple LEDs were successfully prepared on GaN-based materials, making LED white lighting possible. . From the first GaN LED die in 1971 to 1994, GaN HEMTs appeared with high electron mobility blue-light GaN-based diodes. GaN semiconductor materials are developing very rapidly, and the driving force of market demand is very strong. They will replace incandescent lamps and fluorescent lamps as lighting Market leading, with huge room for development. [0003] Due to the high pressure of nitrogen when GaN grows at high temperature, it is difficult to obtain large-sized GaN bulk single crystal materials. At present, most GaN ep...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L33/00H01L33/22
Inventor 沈燕徐现刚王成新夏伟李树强
Owner Shandong Huaguang Optoelectronics Co. Ltd.
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More