High-hardness and high-elastic modulus CrAlN/AlON nano multilayer coating material and preparation method thereof
A coating material, nano-multi-layer technology, applied in coating, metal material coating process, ion implantation plating, etc., can solve the problems of hardness, oxidation resistance temperature and deposition efficiency, hardness and elastic modulus are not high enough , poor high temperature oxidation resistance, etc., to achieve excellent high temperature oxidation resistance, high hardness, and low equipment requirements
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Embodiment 1
[0044] Ar gas partial pressure is 0.1Pa, N 2 The gas partial pressure is 0.1Pa; the CrAlN sputtering power is 118.8W, and the time is 15s; the AlON sputtering power is 120W, and the time is 1s; the substrate temperature is 300°C.
[0045] After testing, the thickness of the obtained CrAlN layer is 5nm, the thickness of the AlON layer is 0.3nm, the total thickness is 1.9μm, the hardness is 31.1GPa, and the elastic modulus is 352.5GPa; X-ray phase analysis shows that the AlON layer is a face-centered cubic structure, and the preferred orientation is (200) and (111), growing in the form of columnar crystals (see figure 2 ).
Embodiment 2
[0047] Ar gas partial pressure is 0.1Pa, N 2 The gas partial pressure is 0.1Pa; the sputtering power of CrAlN is 116.8W, and the time is 15s; the sputtering power of AlON is 120W, and the time is 2s; the substrate temperature is 300°C.
[0048] After testing, the thickness of the obtained CrAlN layer is 5nm, the thickness of the AlON layer is 0.6nm, the total thickness is 2.0μm, the hardness is 33.3GPa, and the elastic modulus is 362.4GPa; X-ray phase analysis shows that the AlON layer is a face-centered cubic structure, and the preferred orientation is (200) and (111), growing in the form of columnar crystals.
Embodiment 3
[0050] Ar gas partial pressure is 0.1Pa, N 2 The gas partial pressure is 0.1Pa; CrAlN sputtering power is 117.2W, time is 15s; AlON sputtering power is 80W, time is 3s; substrate temperature is 300℃.
[0051] After testing, the thickness of the obtained CrAlN layer is 5nm, the thickness of the AlON layer is 0.9nm, the total thickness is 2.2μm, the hardness is 32.2GPa, and the elastic modulus is 365.6GPa; X-ray phase analysis shows that the AlON layer is a face-centered cubic structure with a preferred orientation For (200) and (111), it grows in the form of columnar crystals.
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