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Method for preparing monocrystalline silicon suede

A single crystal silicon wafer and silicon fleece technology is applied in the field of preparing single crystal silicon textured surface, which can solve the problems of poor appearance of cells, influence on luminous efficiency of solar cells, uneven textured surface, etc., so as to shorten the texturing reaction time and improve the Conversion efficiency, the effect of improving light absorption capacity

Inactive Publication Date: 2011-06-29
河北兆能新能源科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the residual cutting fluid on the surface of some silicon wafers cannot be completely removed by using hot water and ultrasonic waves. During the production process, it will cause poor appearance of the cell and uneven suede, which will affect the luminous efficiency of the solar cell.

Method used

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  • Method for preparing monocrystalline silicon suede
  • Method for preparing monocrystalline silicon suede
  • Method for preparing monocrystalline silicon suede

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0013] Embodiment 1: This embodiment comprises the following steps:

[0014] 1) Preparation of coarse throwing liquid: directly use a sodium hydroxide solution with a concentration of 45%; use 45% sodium hydroxide and deionized water to prepare a rough throwing liquid with a concentration of 0.05% in a constant temperature bath at 75°C;

[0015] 2) Preparation of alkaline corrosion solution: raw material ratio, calculated by weight percentage, 0.5% analytically pure sodium hydroxide, 1% analytically pure isopropanol, 0.1% analytically pure sodium silicate and 98.4% deionized water It is 45% sodium hydroxide solution that the analysis pure sodium hydroxide of described amount and deionized water are made into concentration, then in the constant temperature tank of 75 ℃, the 45% sodium hydroxide solution of making and described A certain amount of analytical pure isopropanol, analytical pure sodium silicate and the remaining deionized water are mixed to prepare an alkaline corro...

Embodiment 2

[0017] Embodiment 2: This embodiment comprises the following steps:

[0018] 1) Preparation of coarse throwing liquid: use analytical pure potassium hydroxide and deionized water to prepare a potassium hydroxide solution with a concentration of 45%, and configure it with 45% potassium hydroxide solution and deionized water in a constant temperature tank at 80°C Coarse throwing liquid with a concentration of 0.1%;

[0019] 2) Preparation of alkaline corrosion solution: raw material ratio, calculated by weight percentage, 1% analytical pure potassium hydroxide, 2% analytical pure isopropanol, 0.5% analytical pure sodium silicate and 96.5% deionized water The analytical pure potassium hydroxide and deionized water of said amount are made into a concentration of 45% potassium hydroxide solution, and then in a constant temperature tank of 75°C to 85°C, the prepared 45% potassium hydroxide solution Mix with the amount of analytical pure isopropanol, analytical pure sodium silicate ...

Embodiment 3

[0021] Embodiment 3: this embodiment comprises the following steps:

[0022] 1) The preparation of coarse throwing liquid: use analytical pure sodium carbonate and deionized water to prepare a concentration of 45% sodium carbonate solution, and use 45% sodium carbonate solution and deionized water to configure a concentration of 0.2 in a constant temperature tank at 85°C. % of rough liquid;

[0023] 2) Preparation of alkaline corrosion solution: raw material ratio, calculated by weight percentage, 2% analytically pure sodium carbonate, 3% analytically pure isopropanol, 0.4% analytically pure sodium silicate and 94.6% deionized water; The analytical pure sodium carbonate of described amount and deionized water are made into the sodium carbonate solution that concentration is 45%, then in the constant temperature tank of 85 ℃, the sodium carbonate solution of 45% that makes and the analytical pure sodium carbonate of described amount Isopropanol, analytical pure sodium silicate...

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Abstract

The invention discloses a method for preparing monocrystalline silicon suede, which comprises the following steps of: 1) preparing 0.05 to 0.5 percent rough polishing solution from 45 percent aqueous alkali and deionized water in a thermostat with the temperature of between 75 and 85DEG C; 2) preparing 0.5 to 5 percent analytical pure alkali and 87 to 98.4 percent of deionized water into 45 percent aqueous alkali, and mixing the 45 percent aqueous alkali, 1 to 7 percent analytical pure isopropanol, 0.1 to 1 percent analytical pure sodium silicate and the rest deionized water into alkaline corrosion solution in the thermostat with the temperature of between 75 and 85DEG C; and 3) pre-cleaning a monocrystalline silicon piece for 1 to 6 minutes in the rough polishing solution, taking the monocrystalline silicon piece out, soaking in warm water, reacting for 10 to 30 minutes in the alkaline corrosion solution, taking the monocrystalline silicon piece out, washing with deionized water, anddrying. The prepared monocrystalline silicon suede has small-size and uniform pyramids, the light absorbing capacity of batteries is improved, the suede preparing reaction time is shortened, and the production cost is reduced.

Description

technical field [0001] The invention relates to a solar cell manufacturing technology, in particular to a method for preparing a monocrystalline silicon textured surface. Background technique [0002] In recent years, the increasingly tense issues of energy and the environment have prompted the rapid development of the photovoltaic solar energy industry. Reducing production costs and improving the efficiency of solar cells is the top priority of current research. One of the effective ways to improve the efficiency of solar cells is to increase the light-absorbing ability of solar cells, and the light-absorbing ability mainly depends on the pyramid texture formed on the surface of monocrystalline silicon. The size and uniformity of the reflective film and the thickness and uniformity of the alkali reflective film. The smaller and more uniform the pyramid size on the textured surface, the stronger the light absorption ability of the monocrystalline silicon textured surface, a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/10C23F1/32
Inventor 杜建国张东励旭东王春燕
Owner 河北兆能新能源科技有限公司
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