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Microfine structure and process for producing same

A manufacturing method and structure technology, applied in nanostructure manufacturing, microstructure technology, microstructure devices, etc., can solve problems such as interpolation and pattern density reduction, and achieve the effect of less defects and long-distance order

Inactive Publication Date: 2011-07-13
HITACHI LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, it has been reported that the correlation between chemical patterns and columnar microdomains is not only 1:1, but also when the configuration of chemical patterns has an extended relationship, that is, an n:1 (n is a positive number less than 2) correspondence, there is interpolation possible
However, since the density of the pattern formed by the down-playing method is reduced, it is possible to increase the pattern density through the application of the self-organization phenomenon

Method used

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  • Microfine structure and process for producing same
  • Microfine structure and process for producing same
  • Microfine structure and process for producing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0123] This example relates to the method for producing a polymer thin film having a first microstructure of the present invention, using PS-b-PMMA having a columnar microdomain structure as a polymer block copolymer, and the results of investigations are made with appropriate reference to comparative examples. side to explain.

[0124] (Preparation of Chemically Patterned Substrate)

[0125] The substrate is a silicon substrate with a natural oxide film. After grafting polystyrene on the entire surface, the grafted layer of polystyrene is patterned by electron beam (EB) photolithography to obtain polystyrene (PS) and polystyrene. Surface patterned substrates with methyl methacrylate (PMMA) having different wettability. The details will be described in turn below.

[0126]The polystyrene-grafted substrate was fabricated by the following method. First, a silicon substrate (4 inches) having a natural oxide film was washed with a pyran solution. Due to the oxidation effect of...

Embodiment 2

[0150] This embodiment relates to the manufacture method of the polymer thin film having the first microstructure of the present invention. As a polymer block copolymer, PS-b-PMMA that forms a sheet-like microdomain structure is used. The results of the study are appropriately referred to A comparative example will be described.

[0151] (Preparation of Chemically Patterned Substrate)

[0152] Figure 12 (a) to (c) are simulation diagrams of the pattern arrangement of the chemical pattern substrate. Same as in Example 1, the polystyrene grafted layer on the surface 320 of the polystyrene grafted substrate is patterned by EB photolithography, and the silicon substrate exposes a line-like region 330 with a width of r on the surface of the polystyrene grafted layer. , to fabricate chemically patterned substrates arranged in parallel with lattice spacing d. The pattern configuration on the fabricated substrate is as Figure 12 shown. On one substrate cut out from the pattern re...

Embodiment 3

[0161] This embodiment relates to the manufacturing method of the polymer thin film having the first fine structure of the present invention, as the polymer block copolymer, adopts PS-b- polydimethylsiloxane (PDMS) to carry out the research result, while appropriate It demonstrates with reference to a comparative example.

[0162] (Preparation of chemically patterned substrate)

[0163] The polystyrene-grafted substrate was produced in the same manner as in Example 1, and the surface state of the polystyrene-grafted substrate was evaluated. As a result, it was confirmed that a polystyrene-grafted film was formed on the surface of the silicon substrate.

[0164] Same as Example 1, the polystyrene grafted layer on the surface of the polystyrene grafted substrate was patterned by EB photolithography, and a circular area of ​​diameter r of the silicon substrate was exposed on the surface of the polystyrene grafted layer, and a crystal was produced. A chemically patterned substrat...

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Abstract

The invention provides a process for producing a microfine structure which comprises: a first stage in which a polymer layer comprising a high-molecular weight block copolymer (103) having at least a first segment (101) and a second segment (102) is disposed on a surface of a substrate (105); and a second stage in which the polymer layer is caused to undergo microphase separation and thereby forma structure composed of a continuous phase (204) made up of the second segments (102) and microdomains (104) which are made up of the first segments (101) and are arranged in such a direction that the microdomains pierce the continuous phase (204). The process is characterized in that the substrate (105) has pattern members which have been scatteringly disposed in the positions where the microdomains (104) are to be formed and which differ in chemical property from the surface of the substrate (105). The process is further characterized in that the thickness (t) of the polymer layer disposed in the first stage and the intrinsic periodicity (do) of the microdomains (104) formed from the polymer-blocked copolymer (103) satisfy the relationship: t is more than (m+0.3)*do and less than (m+0.7)*do, provided that m is an integer of 0 or larger.

Description

technical field [0001] The present invention relates to a fine structure body having a fine structure formed by performing fine phase separation of a polymer block copolymer on the surface of a substrate and a manufacturing method thereof. In addition, it relates to a patterned substrate having a regularly arranged pattern of microdomains in a fine structure on its surface and a method for manufacturing the same. Background technique [0002] In recent years, along with miniaturization and high performance of electronic devices, energy storage devices, sensors, etc., the need to form fine regular array patterns with a size of several nm to hundreds of nm on a substrate has increased. Therefore, it is required to determine a method for producing such a fine pattern structure with high precision and at low cost. [0003] As a method of processing such a fine pattern, a top down method represented by a photolithography method, that is, a method of giving a shape by finely engr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B82B3/00H01L21/3065C08F297/00
CPCB81B2203/0361H01L21/3083H01L21/31144H01L21/32139H01L21/0337B81C1/00031B81C2201/0198G03F7/0002Y10T428/24802Y10T428/24479Y10T156/10
Inventor 多田靖彦吉田博史
Owner HITACHI LTD
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