Vapor phase deposition material for forming film, film sheet with the film, and laminated sheet
A technology of vapor deposition and thin film, which is applied in the direction of metal material coating process, coating, layered products, etc., can solve the problems of reduced voltage resistance, increased manufacturing cost, and reduced gas barrier property, so as to improve gas barrier property , The effect of maintaining high gas barrier properties, excellent transparency and gas barrier properties
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[0069]
[0070] First, the first oxide powder, the second oxide powder, the binder, and the organic solvent are mixed in a predetermined ratio by wet mixing by a ball mill to prepare a slurry with a concentration of 40% by mass. At this time, the first oxide powder uses high-purity SiO powder with an average particle size of 1.3 μm and a purity of 99.8%, and the second oxide powder uses high-purity ZnO powder with an average particle size of 0.8 μm and a purity of 99.8%. The mixture uses polyvinyl butyral, and the organic solvent uses ethanol. As the SiO powder, commercially available granular SiO was crushed with an agate mortar and pestle and then crushed by a jet mill grinding device (manufactured by Seishin Co., Ltd.: FS-4 type). In addition, the mixing amount of SiO powder and ZnO powder was adjusted so that SiO contained in the vapor deposition material after formation was 5 mol% and ZnO was 95 mol%.
[0071] Next, the prepared slurry was spray-dried using a spray dryer to...
Example Embodiment
[0072]
[0073] The mixing amount of SiO powder and ZnO powder was adjusted so that SiO contained in the vapor deposition material after formation was 10 mol%, and ZnO was 90 mol%, and it carried out similarly to Example 1, and obtained the vapor deposition material. The average particle diameters of the SiO particles and ZnO particles contained in the vapor deposited material, the contents of SiO and ZnO contained in the vapor deposited material, and the basicity of the particles are shown in Table 1 below.
Example Embodiment
[0074]
[0075] The mixing amount of SiO powder and ZnO powder was adjusted so that SiO contained in the vapor deposition material after formation was 20 mol%, and ZnO was 80 mol%, and it carried out similarly to Example 1, and obtained the vapor deposition material. The average particle diameters of the SiO particles and ZnO particles contained in the vapor deposited material, the contents of SiO and ZnO contained in the vapor deposited material, and the basicity of the particles are shown in Table 1 below.
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