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Vapor phase deposition material for forming film, film sheet with the film, and laminated sheet

A technology of vapor deposition and thin film, which is applied in the direction of metal material coating process, coating, layered products, etc., can solve the problems of reduced voltage resistance, increased manufacturing cost, and reduced gas barrier property, so as to improve gas barrier property , The effect of maintaining high gas barrier properties, excellent transparency and gas barrier properties

Inactive Publication Date: 2011-09-21
MITSUBISHI MATERIALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, since the sheet material for back protection shown in the above-mentioned Patent Document 1 uses a metal foil such as aluminum foil as a gas barrier material, if the sheet material is applied to a chassis of a solar cell module, the withstand voltage may be lowered, and the current may be reduced. leakage
In addition, if the sheet material using metal foil has a thickness of 20 μm or less, the number of pinholes generated between the heat-resistant and weather-resistant resin and the metal foil will increase, and the gas barrier property will be significantly reduced.
On the other hand, if the thickness of the metal foil is increased, there is a problem that the manufacturing cost increases
In addition, in the case of inorganic oxides such as silica and alumina used in the above-mentioned Patent Document 2 and Patent Document 3, it is necessary to ensure a film thickness of 100 nm or more in order to obtain high gas barrier properties. Fully temperament

Method used

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  • Vapor phase deposition material for forming film, film sheet with the film, and laminated sheet
  • Vapor phase deposition material for forming film, film sheet with the film, and laminated sheet
  • Vapor phase deposition material for forming film, film sheet with the film, and laminated sheet

Examples

Experimental program
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Effect test

Embodiment 1

[0070] First, a first oxide powder, a second oxide powder, a binder, and an organic solvent were mixed in a predetermined ratio by wet mixing by a ball mill to prepare a slurry having a concentration of 40% by mass. At this time, the first oxide powder uses high-purity SiO powder with an average particle size of 1.3 μm and a purity of 99.8%, and the second oxide powder uses high-purity ZnO powder with an average particle size of 0.8 μm and a purity of 99.8%. The mixture uses polyvinyl butyral, and the organic solvent uses ethanol. As the SiO powder, commercially available granular SiO was crushed with an agate mortar and pestle, and then pulverized by a jet mill pulverization device (manufactured by Seishin Co., Ltd.: FS-4 type). In addition, the mixing amount of SiO powder and ZnO powder was adjusted so that SiO contained in the formed vapor deposition material was 5 mol %, and ZnO was 95 mol %.

[0071] Next, the prepared slurry was spray-dried using a spray dryer to obtain...

Embodiment 2

[0073] A vapor deposition material was obtained in the same manner as in Example 1 except that the mixing amount of SiO powder and ZnO powder was adjusted so that SiO contained in the formed vapor deposition material was 10 mol % and ZnO was 90 mol %. The average particle diameters of SiO particles and ZnO particles contained in the obtained vapor deposition material, the contents of SiO and ZnO contained in the vapor deposition material, and the basicity of the particles are shown in Table 1 below.

Embodiment 3

[0075] A vapor deposition material was obtained in the same manner as in Example 1 except that the mixing amount of SiO powder and ZnO powder was adjusted so that SiO contained in the formed vapor deposition material was 20 mol % and ZnO was 80 mol %. The average particle diameters of SiO particles and ZnO particles contained in the obtained vapor deposition material, the contents of SiO and ZnO contained in the vapor deposition material, and the basicity of the particles are shown in Table 1 below.

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Abstract

The present invention provides a vapor phase deposition material which is suitable for forming a film with excellent transparency and excellent air barring performance, a film sheet with the film, and a laminated sheet. The vapor phase deposition material of the invention is manufactured through mixing a first oxide powder and a second oxide powder. The vapor phase deposition material is characterized in that: the first oxide powder is SnO powder; the purity of the first oxide of the first oxide powder is more than 98%; the second oxide powder is one powder or a mixed powder with more than two powders which are selected from: ZnO, MgO and CaO; the purity of the second oxide of the second oxide powder is more than 98%; the vapor phase deposition material is composed of particles which comprises first oxide particles and second oxide particles; a molar ratio between the first oxide and the second oxide in the vapor phase deposition material is 5-85: 95-15; and the alkalinity of the particle is more than 0.1.

Description

technical field [0001] The present invention relates to a vapor deposition material suitable for forming a thin film having excellent properties such as transparency and gas barrier properties, a film sheet and a laminated sheet including the thin film. More specifically, it relates to a vapor deposition material for forming a thin film excellent in these various characteristics, and especially suitable as a gas barrier material for a liquid crystal display, an organic EL display, or a solar cell module, and a film sheet and a laminated sheet having the thin film material. Background technique [0002] Devices such as liquid crystal displays, organic EL displays, and solar cells are generally not resistant to moisture, and their characteristics rapidly deteriorate due to moisture absorption. Therefore, components with high moisture resistance, that is, gas barrier properties that prevent the penetration or intrusion of oxygen or water vapor, etc., must be equipped. [0003]...

Claims

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Application Information

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IPC IPC(8): C23C14/08B32B9/04
Inventor 黛良享有泉久美子黑光祥郎
Owner MITSUBISHI MATERIALS CORP
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