Silicon core corrosion process
A silicon core and process technology, applied in the field of cleaning processes using silicon cores, can solve problems such as operator hazards, environmental impact, and a large amount of nitrogen oxides.
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Embodiment 1
[0015] Embodiment one: a silicon core etching process, comprising the following process steps:
[0016] (1) Silicon core corrosion: Select a silicon core with a length of 2000 mm and a diameter of 8 mm, soak the silicon core in an alkaline solution for 10 minutes, add hydrogen peroxide with a mass percentage concentration of 0.5% during soaking, and the temperature of the alkaline solution is 60°C; the components of the alkaline solution are: potassium hydroxide 300g / L, sodium fluoride 40g / L, and the rest is water;
[0017] (2) Primary rinsing: Rinse the silicon core treated in step (1) in pure water for 5 minutes to remove the alkali solution;
[0018] (3) Neutralization: Soak the silicon core after primary rinsing in a hydrofluoric acid solution to neutralize the residual alkali solution. The soaking time is 2 minutes, and the mass percent concentration of the hydrofluoric acid solution is 10 %;
[0019] (4) Secondary rinsing: Rinse the neutralized silicon core in pure wat...
Embodiment 2
[0022] Embodiment two: a silicon core etching process, comprising the following process steps:
[0023] (1) Silicon core corrosion: select a silicon core with a length of 2200 mm and a diameter of 12 mm, soak the silicon core in an alkaline solution for 20 minutes, add hydrogen peroxide with a mass percentage concentration of 1% during soaking, and the temperature of the alkaline solution is 50°C; the components of the alkaline solution are: potassium hydroxide 350g / L, sodium fluoride 50g / L, and the rest are water;
[0024] (2) Primary rinsing: Rinse the silicon core treated in step (1) in pure water for 10 minutes to remove the alkali solution;
[0025] (3) Neutralization: Soak the silicon core after primary rinsing in a hydrofluoric acid solution to neutralize the residual alkali solution. The soaking time is 3 minutes, and the mass percent concentration of the hydrofluoric acid solution is 5 %;
[0026] (4) Secondary rinsing: Rinse the neutralized silicon core in pure wat...
Embodiment 3
[0029] Embodiment three: a silicon core etching process, comprising the following process steps:
[0030] (1) Silicon core corrosion: select a silicon core with a length of 2100 mm and a diameter of 10 mm, soak the silicon core in an alkaline solution for 15 minutes, add hydrogen peroxide with a mass percentage concentration of 0.8% during soaking, and the temperature of the alkaline solution is 55°C; the components of the alkaline solution are: potassium hydroxide 320g / L, sodium fluoride 45g / L, and the rest are water;
[0031] (2) Primary rinsing: Rinse the silicon core treated in step (1) in pure water for 8 minutes to remove the alkali solution;
[0032] (3) Neutralization: Soak the silicon core after primary rinsing in a hydrofluoric acid solution to neutralize the residual alkali solution. The soaking time is 2.5 minutes, and the mass percent concentration of the hydrofluoric acid solution is 8 %;
[0033] (4) Secondary rinsing: Rinse the neutralized silicon core in pur...
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