Device and method for etching conductive film of unviewable zone on touch screen

Abstract

The invention discloses a device and method for etching a conductive film of an unviewable zone on a touch screen. The output end of a high-frequency short-pulse laser is provided with an optical shutter; the output end of the optical shutter is provided with a beam expander; the output end of the beam expander is successively provided with 45-degree total reflection mirrors; the output end of each 45-degree total reflection mirror is successively provided with a dynamic focus lens and a scanning field lens; the scanning field lens just faces to a working platform; one side of the working platform is provided with a blowing device; and the other side of the working platform is provided with a dust catching plant. The conductive film material of the unviewable zone is etched by an optimized optical path focusing system and a high-frequency pulse laser, thus a thinner and stable line width is obtained, and a substrate is not damaged.

Description

technical field [0001] The invention relates to a laser micromachining device, in particular to a device and method for etching a conductive thin film in an invisible area on a touch screen. Background technique [0002] Due to the continuous growth of demand for electronic products for different purposes such as the IT industry (small cell) and television (large cell), there are higher etching functional requirements for the etching of conductive films on glass substrates or invisible areas of PET substrates. Specifically, when the thickness of the etched conductive film varies within the range of 200nm to 30um, it is possible to produce stable, small line width, and fully functional conductive film layer lines. [0003] The realization of the line function of the traditional conductive film layer is to use the screen printing method. The thinnest printing width of the conductive film material in the invisible area can only reach 100um, and the yield rate is low, the linear...

AI Technical Summary

Problems solved by technology

[0003] The realization of the line function of the traditional conductive film layer is to use the screen printing method. The thinnest printing width of the conductive film material in the invisible area can only reach 100um, and the yield rate is low, the linearity is uneven, and it is cumbersome to replace different batches of products. Cleaning with chemical liquid, the stretching net tension value is small, the cost is also high, the waste gas and liquid produced seriously affect the environment, the finished material has poor wear resistance and chemical resistance, and is easy to age and become brittle

This printing method has complex procedures, requires more consumables in production, and requires more manpower to maintain the production line, which has great limitations. The poor linearity of the conductive film material pins in the invisible area of ​​​​screen printing has become an important cause of failure of displays and touch screens. Factors, these defective products are an important waste of electronic materials that are close to finished products

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