Method for preparing micro-nanometer fluid system through compound developing of positive and negative photoresists

A positive and negative photoresist and fluid system technology, applied in the field of micro-nano fluid system preparation, can solve problems such as reduced bonding strength, excessive bonding temperature and pressure, and pipeline blockage, achieving fewer processing steps, ensuring uniformity, and easy Achieved effect

Inactive Publication Date: 2011-11-16
HEFEI UNIV OF TECH
View PDF5 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The most used method is the thermocompression bonding method, which is simple to implement, but usually requires too high bonding temperature and high pressure, which will cause serious deformation of the microfluidic pipeline or damage the microstructure pattern, and even pipeline blockage. Happening
When the temperature and pressure are too low, the bonding strength will be reduced, resulting in failure to bond.
The bonding force of the channels produced by this method is not strong, the mechanical properties are not good, and the length of the channels is not easy to control

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing micro-nanometer fluid system through compound developing of positive and negative photoresists
  • Method for preparing micro-nanometer fluid system through compound developing of positive and negative photoresists
  • Method for preparing micro-nanometer fluid system through compound developing of positive and negative photoresists

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] In the present embodiment, the micro-nanofluidic system is fabricated by the composite development method of positive and negative photoresist, and the operation is as follows:

[0027] a. Take the glass sheet as the base, wash it with water and acetone, put it in an oven, and bake it at 130°C for 20 minutes to remove water vapor and residual acetone. After baking, oxygen plasma treatment was performed to increase the surface energy and the adhesion of the photoresist. The vacuum degree of oxygen plasma treatment on the glass substrate was 25Pa, the power was 60W, and the bombardment time was 90 seconds. Spin-coat a layer of AZ1350 positive photoresist with a thickness of about 1.5 microns on its surface, bake at 90 °C for 20 minutes, and then expose it under an exposure machine in the form of mask exposure, with an exposure dose of 200 mJ / cm 2 The exposure time is 2 minutes and 30 seconds, and then it is developed in a 0.5% NaOH solution by mass, and the development ti...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a method for preparing a micro-nanometer fluid system through the compound developing of positive and negative photoresists. Specifically, the method comprises the steps of: taking a glass sheet as the substrate, preparing a positive photoresist layer with a raster pattern, coating the surface of the positive photoresist layer with a SiO2 film, then spin-coating the surface of the SiO2 film with a negative photoresist layer, fully exposing and developing the photoresist layers, thus obtaining the micro-nanometer fluid system. Being novel and simple, the preparation method of the invention ensures the uniform size and unfrequent obstruction of channels. With a high success rate, the method has flexible operation, low preparation cost, no need for expensive experiment equipment, thus being beneficial for large scale production.

Description

1. Technical field [0001] The invention relates to a preparation method of a micro-nano fluid system, in particular to a method for preparing a micro-nano fluid system by compound development of positive and negative photoresists. 2. Background technology [0002] In recent years, fundamental and technical application research related to nanofluidic systems has become an attractive frontier field, which is generally defined as the cross-section of a fluid flow channel with more than one dimension in the size range of hundreds to several nanometers. The fluid transport in it has specific properties that can alter many of the physicochemical properties that govern fluid transport and molecular behavior at the macro- and micro-scale. The research based on this system not only breaks through some important concepts of traditional theory, but also some in-depth research results have important applications in many fields such as DNA molecule stretching manipulation, drug release t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00G03F7/30
Inventor 王旭迪金建郑正龙李鑫汤启升
Owner HEFEI UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap