Preparation method of thick film solar cell
A solar cell, thick film technology, applied in the direction of circuits, electrical components, final product manufacturing, etc., can solve the problems of low photoelectric conversion rate, harsh production conditions, and high production cost of solar cells, to improve cell output, increase carrier life, and the effect of improving photoelectric conversion efficiency
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[0025] The flexible substrate polysilicon / amorphous silicon stacked thick film solar cell is prepared according to the following steps:
[0026] (1) Preparation and surface treatment of flexible substrate: Quartz or stainless steel is cut to obtain a 156mm*156mm quartz substrate / stainless steel substrate, soaked in glass washing solution / stainless steel washing solution for 12 hours, and then put Wash in acetone, then wash with absolute ethanol, and dry to obtain a flexible substrate;
[0027] (2) Deposition and heat treatment of silicon nitride insulating layer: put the cleaned and dried substrate into the PECVD vacuum chamber, and start to heat up while flushing the vacuum. When the temperature of the vacuum chamber rises to 200°C and remains stable, the The vacuum chamber is filled with 10% SiH diluted by N2 4 and NH 3 to 4Pa, where the gas flow ratio of SiH4 and NH3 is 35:12, and then add radio frequency power discharge, the power density is 0.2W / cm 2 , first deposited ...
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