A kind of acetic acid series ITO etchant and preparation technology

Abstract

The invention discloses an acetic acid ITO (Indium Tin Oxide) etching liquid and a preparation process thereof. The acetic acid ITO etching liquid is prepared by uniformly mixing hydrochloric acid, acetic acid, inorganic salt chloride and pure water. The ITO etching liquid preparation process comprises the following steps of : under the normal pressure and temperature, controlling or removing foreign ions in the hydrochloric acid and the acetic acid by strong acidic ion-exchanging resin; maintaining the rotation speed of the mixer of a dosing tank; sequentially adding part of the pure water, acetic acid, hydrochloric acid, inorganic salt chloride and the rest of the pure water in the dosing tank; and fully mixing, filtering the mixture by a filter, and finally preparing the acetic acid ITO etching liquid. In the invention, the acetic acid ITO etching liquid has small granularity, high purity, strong etching monotony, can control the etching angle of the transparent conducting film of an ITO semi-conductor and the etching mount of different metal layers, and has no influences to client terminal equipment and personnel.

Description

technical field [0001] The invention relates to a composition for chemical etching of metal materials and a preparation process thereof, in particular to an acetic acid-based ITO etching solution and a preparation process. Background technique [0002] Etching is the technique of removing material using chemical reaction or physical impact. Etching technology is divided into wet etching and dry etching, wherein wet etching uses chemical reagents to achieve the purpose of etching through chemical reactions. Thin-film field-effect transistor liquid crystal display (TFT~LCD), light-emitting diode (LED), organic light-emitting diode (OLED) and other industries use hydrochloric acid and nitric acid to etch the indium tin oxide semiconductor transparent conductive film (ITO) in the panel process. Mix the aqueous solution. However, the mixed aqueous solution of hydrochloric acid and nitric acid is a general-purpose ITO etching solution, which has strong corrosion ability. During ...

AI Technical Summary

Problems solved by technology

However, the mixed aqueous solution of hydrochloric acid and nitric acid is a general-purpose ITO etching solution, which has strong corrosion ability. During the reagent etching process, it is often difficult to control the etching angle and etching time, and the danger to operators and client equipment is also high.

[0003] In recent years, while people's demand for liquid crystal displays has been increasing, higher requirements have been placed on product quality and screen accuracy. The composition and particle size of the ITO etching solution directly affect the etching effect, which determines the quality of the circuit board manufacturing. The quality of the process affects the accuracy and quality of the high-density thin wire image