Device and method for pulse laser etching of conducting film layer on double-sided indium tin oxide (ITO) glass

Abstract

The invention relates to a device and a method for the pulse laser etching of a conducting film layer on double-sided indium tin oxide (ITO) glass. The front and back surfaces of a film material are provided with a set of pulse laser etching device respectively. Each set of pulse laser etching device comprises a high-frequency short-pulse laser, a semi-transmitting semi-reflecting mirror, a Glan prism and a completely reflecting mirror; the output end of the high-frequency short-pulse laser is sequentially provided with an optical gate, a beam expander and the semi-transmitting semi-reflecting mirror; the output end of the semi-transmitting semi-reflecting mirror is provided with a first 1/2 wave plate and the completely reflecting mirror; the output end of the first 1/2 wave plate is sequentially provided with a first Glan prism and a first three-dimensional (3D) dynamic focusing lens; the output end of the first 3D dynamic focusing lens is provided with a first galvanometer; the output end of the completely reflecting mirror is provided with a second 1/2 wave plate; the output end of the second 1/2 wave plate is sequentially provided with a second Glan prism and a second 3D dynamic focusing lens; the output end of the second 3D dynamic focusing lens is provided with a second galvanometer; and the output ends of the first and second galvanometers are both dead against the surface of the film material. The device and the method are used for etching double-sided ITO glass in different touch screen products to realize high-efficiency high-accuracy circuit manufacturing.

Description

technical field [0001] The invention relates to a device and a method for pulse laser etching a conductive film layer on double-sided ITO glass, and belongs to the technical field of laser micromachining. Background technique [0002] Traditionally, there are two methods of manufacturing lines on the double-sided conductive film layer on the touch screen: chemical wet etching and yellow photolithography. Among them, in the process method of chemical wet etching conductive film layer, the process design takes a long time to complete the etching, and the cost of fixtures and consumables needs to be invested. The pollution is more serious, and the energy waste of the whole technological process is more serious. However, the yellow photolithography process requires a large initial investment and high cost. The selectivity of materials is relatively narrow, and it is not suitable for all the production methods of conductive film layers on the market. In addition, the daily maint...

AI Technical Summary

Problems solved by technology

[0004] The width of the double-sided conductive film layer on the traditional wet-etched touch screen can only reach 80um, and the yield rate is low, the linearity is uneven, and it is cumbersome to replace different batches of products. It needs to be cleaned with chemical medicine, which pollutes the environment;...

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