High-efficient GaN-based semiconductor light emitting diode

A technology of light-emitting diodes and semiconductors, applied in semiconductor devices, electrical components, circuits, etc., to achieve the effects of improving luminous efficiency, reducing electron leakage current, and increasing electron concentration

Inactive Publication Date: 2012-03-07
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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  • High-efficient GaN-based semiconductor light emitting diode
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  • High-efficient GaN-based semiconductor light emitting diode

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[0018] Hereinafter, the present invention will be further described in detail through embodiments and drawings.

[0019] Implementation process one

[0020] The invention consists of a substrate, an N-type doped layer, a multiple quantum well light-emitting layer, a P-type doped layer and an electrode, and its structure is as figure 1 Shown.

[0021] The substrate material is sapphire, silicon or silicon carbide.

[0022] The N-type doped layer is a silicon-doped GaN-based semiconductor material, which can be GaN, AlGaN, or InGaN, and the doping concentration is 1×10 17 ~1×10 20 cm -3 .

[0023] The multiple quantum well light-emitting layer is an InGaN / GaN multiple quantum well structure, or an InGaN / InGaN multiple quantum well structure, or a GaN / AlGaN multiple quantum well structure, or an AlGaN / AlGaN multiple quantum well structure; the multiple quantum well structure is close to P The band gap of the last barrier of the type AlGaN electron barrier layer decreases linearly along th...

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Abstract

The invention discloses a GaN-based semiconductor light emitting diode (LED), which is capable of enhancing a luminous efficiency under high injection currents. The GaN-based LED is composed of a substrate, an N type doping layer, a multi-quantum well luminescent layer, a P type doping layer and electrodes. A band gap of a last barrier in the multi-quantum well luminescent layer decreases linearly along a growth direction, wherein the last barrier approaches a P type AlGaN electronic barrier layer; and the material of the band gap is alloy that is formed by other barrier materials in the multi-quantum well structure and InN or GaN; moreover, the content of the InN or the GaN increases linearly along the growth direction.

Description

technical field [0001] The invention relates to a semiconductor light-emitting diode (LED), in particular to a GaN-based semiconductor light-emitting diode capable of enhancing luminous efficiency under high injection current. Background technique [0002] Since the 1990s, with a series of major breakthroughs in the growth process of GaN-based semiconductor materials, a new generation of semiconductor materials represented by GaN has gradually emerged. GaN-based semiconductor materials can be made into highly efficient blue, green and white light-emitting diodes. As a new type of high-efficiency solid-state light source, they have the characteristics of long life, energy saving, and environmental protection. They have been widely used in large-screen color displays, automotive lighting, traffic signals, multimedia displays, and optical communications. They will also replace incandescent lamps, Fluorescent lamps have achieved another revolution in the history of human lighti...

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Application Information

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IPC IPC(8): H01L33/06H01L33/32H01L33/14
Inventor 陆卫夏长生王少伟张波甄红楼王兴军陈效双
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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