High-efficient GaN-based semiconductor light emitting diode
A technology of light-emitting diodes and semiconductors, applied in semiconductor devices, electrical components, circuits, etc., to achieve the effects of improving luminous efficiency, reducing electron leakage current, and increasing electron concentration
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[0018] Hereinafter, the present invention will be further described in detail through embodiments and drawings.
[0019] Implementation process one
[0020] The invention consists of a substrate, an N-type doped layer, a multiple quantum well light-emitting layer, a P-type doped layer and an electrode, and its structure is as figure 1 Shown.
[0021] The substrate material is sapphire, silicon or silicon carbide.
[0022] The N-type doped layer is a silicon-doped GaN-based semiconductor material, which can be GaN, AlGaN, or InGaN, and the doping concentration is 1×10 17 ~1×10 20 cm -3 .
[0023] The multiple quantum well light-emitting layer is an InGaN / GaN multiple quantum well structure, or an InGaN / InGaN multiple quantum well structure, or a GaN / AlGaN multiple quantum well structure, or an AlGaN / AlGaN multiple quantum well structure; the multiple quantum well structure is close to P The band gap of the last barrier of the type AlGaN electron barrier layer decreases linearly along th...
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