Vanadium dioxide thin film and preparation method thereof

A technology of vanadium dioxide and vanadium pentoxide, applied in the direction of liquid chemical plating, metal material coating process, coating, etc., to achieve the effect of good crystallinity, easy post-processing, and strong binding force

Inactive Publication Date: 2012-03-21
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] It can be seen that the hydrothermal method is used to synthesize various VO 2 The nanostructure of VO has been extensively

Method used

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  • Vanadium dioxide thin film and preparation method thereof
  • Vanadium dioxide thin film and preparation method thereof
  • Vanadium dioxide thin film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] Add 0.3 g of vanadium pentoxide and 0.6 g of oxalic acid into 300 mL of deionized water, stir and react in a water bath at 80 °C for 24 hours to obtain a blue vanadium precursor solution; transfer 30 mL of it to an autoclave, and clean the FTO glass was vertically inserted into the precursor solution, and after reacting at 200 °C for 12 hours, the long VO 2 Thin-film FTO glass;

[0037] figure 1 VO prepared for this embodiment 2 The scanning electron microscope photo of the thin film shows that it is flake VO 2 Textured film with specific surface morphology;

[0038] figure 2 VO prepared for this embodiment 2 The X-ray diffraction pattern of the film, it can be seen from the figure that the obtained VO 2 For the B phase, the space group is C2 / m.

Embodiment 2

[0040] Add 0.3 g of vanadium pentoxide and 0.6 g of oxalic acid into 300 mL of deionized water, stir and react in a water bath at 80 °C for 12 hours to obtain a blue vanadium precursor solution; transfer 30 mL of it to an autoclave, and put the cleaned SnO 2 The film substrate was vertically inserted into the precursor solution, and after reacting at 250 °C for 96 hours, the SnO 2 VO 2 film;

[0041] image 3 VO prepared for this example 2 The scanning electron micrograph of the thin film shows that it is an obvious morphology composed of interwoven sheet-like units.

Embodiment 3

[0043] Add 0.3 g of vanadium pentoxide and 0.6 g of oxalic acid into 300 mL of deionized water, stir and react in a water bath at 80 °C for 24 hours to obtain a blue vanadium precursor solution; transfer 30 mL of it to an autoclave, and clean the TiO 2 The film substrate was vertically inserted into the precursor solution, and after reacting at 200 °C for 23.5 hours, the TiO 2 VO 2 film;

[0044] Figure 4 VO prepared for this example 2 The scanning electron micrograph of the thin film shows that it also has a morphology composed of a specific sheet structure.

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Abstract

The invention relates to a vanadium dioxide thin film and a preparation method thereof. The method comprises the following steps of: preparing a quadrivalent vanadium precursor growth solution; directly soaking a cleaned substrate in the growth solution and transferring into a high-pressure reaction kettle; performing hydrothermal reaction at the temperature of 150-250 DEG C for 0.5-96 hours; and preparing the vanadium dioxide thin film with flaky VO2 accumulation through induction effect of the substrate. The vanadium dioxide thin film prepared by the invention has a specific microcosmic shape (for example, flaky or rod-like VO2 accumulation), and is a thin film with a certain nanostructure, which cannot be realized by using the conventional thin film preparation process (for example, sol-gel, sputtering and the like); in addition, the nanostructure of the thin film has a certain difference from the microcosmic shape of the directly synthesized powder. The hydrothermally grown VO2 thin film has better crystallinity without being annealed.

Description

technical field [0001] The invention relates to a method for preparing a vanadium dioxide thin film, which belongs to the technical field of functional materials and thin films, and specifically relates to a hydrothermal growth method for preparing a vanadium dioxide thin film by substrate induction using a tetravalent vanadium precursor solution on different substrates . Background technique [0002] Vanadium oxide is a complex system of multivalent states and polycrystalline phases, with more than 10 kinds of crystal structures, mainly including B phase, A phase, M phase and R phase. At present, the most studied is the M / R phase vanadium dioxide (VO) with thermochromic properties. 2 ), which can be widely used in smart window coatings, photoelectric switches, thermistors, and optical information storage. Vanadium dioxide, as a functional material with thermally induced phase change characteristics, can undergo a reversible phase transition from a low-temperature semicond...

Claims

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Application Information

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IPC IPC(8): C23C18/12
Inventor 黄富强丁尚军李德增赵伟
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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