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Method for treating pollutant of workpiece provided with yttrium oxide coating layer

A treatment method, a technology of yttrium oxide, applied in chemical instruments and methods, cleaning methods using liquids, cleaning methods and utensils, etc., can solve problems such as pollution, reduced wafer production efficiency, easy to drop wafers to be etched, etc.

Active Publication Date: 2012-06-27
ADVANCED MICRO FAB EQUIP INC CHINA
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Problems solved by technology

[0005] However, the inventors have found that after the workpiece with the yttrium oxide coating has been used for a period of time, there will be some pollutants on its surface. If the pollutants are not treated, they will pile up and fall easily on the wafer to be etched, causing pollution. , ultimately reducing wafer production efficiency

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  • Method for treating pollutant of workpiece provided with yttrium oxide coating layer
  • Method for treating pollutant of workpiece provided with yttrium oxide coating layer
  • Method for treating pollutant of workpiece provided with yttrium oxide coating layer

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[0044] As described in the background technology, after using the workpiece with yttrium oxide coating for a period of time, some pollutants will be produced on it. The inventor has carried out SEM test and EDS spectrum analysis to the pollutants, and the results are respectively as follows figure 1 and figure 2 As shown, its main components are compounds based on fluorine and yttrium. The present invention proposes to use acidic solution to remove most of the pollutants with poor adhesion, and then rinse with deionized water, so that the contaminated workpiece can be reused. .

[0045] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. Since the emphasis is placed upon illustrating the principles of the invention, the drawings are not drawn to scale.

[0046] The following is an example of ...

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Abstract

The invention relates to a method for treating the pollutant of a workpiece which is provided with an yttrium oxide coating layer and is used for etching plasma, which comprises the steps of: at least adopting acid solution to wipe the workpiece, and then adopting deionized water to flush the workpiece. The treatment method can be used for leading the polluted workpiece such as a spray head, a focusing ring and the like to be used again.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a method for treating pollutants of workpieces with yttrium oxide cladding layers used for plasma etching. Background technique [0002] In recent years, in the field of semiconductor manufacturing, plasma etching is involved in many processes, such as the plasma etching of silicon in the formation of TSV (Through Silicon Via), and the plasma etching of metal in the formation of metal interconnection lines. The formation of gates in transistors involves the etching of dielectric layers. The above process is generally carried out in a plasma chamber, where various workpieces, such as focus rings, shower heads, etc., are arranged. [0003] Taking the shower head as an example, the substrate of the existing shower head is generally aluminum, but aluminum is easily corroded in the plasma environment, resulting in a short service life of the shower head. In response to thi...

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Application Information

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IPC IPC(8): B08B7/04B08B3/02B08B3/08B08B3/12
Inventor 贺小明万磊陈振军倪图强
Owner ADVANCED MICRO FAB EQUIP INC CHINA
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