Method utilizing TSV (Through-Silicon-Via) to realize wafer level package of GaAs (gallium arsenide) image sensor
An image sensor and wafer-level packaging technology, applied in radiation control devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of small signal delay, low capacitance value, high cost, etc., and achieve low cost, high interaction Continuous density, no radiation damage effect
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[0041] In order to fully demonstrate the advantages and positive effects of the present invention, the substantive features and remarkable progress of the present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0042] refer to figure 2 The GaAs image sensor wafer 1 includes several chips, and image sensing components are formed on the front of each chip through a preset manufacturing process, including the formation of image sensing units 2 and pad electrodes 3 . The pad electrode 3 is distributed in the non-functional area around the image sensing unit, and the material selected can be aluminum, gold or copper. The image sensor is used in the visible light range, and the wafer thickness is 350 μm.
[0043] Thereafter, refer to image 3, bonding the wafer 1 to a transparent substrate 5 . The substrate plays the role of light transmission, protection from external pollution and mechanical damage, and at the same tim...
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