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Dry film photoresist containing adhesive additive and plasticizer

A technology of plasticizers and additives, applied in the field of dry film photoresist, can solve problems such as difficult control of adhesion

Inactive Publication Date: 2012-08-29
ZHUHAI DYNAMIC TECH OPTICAL IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Components that positively affect exposure time or development time are likely to have a negative impact on the necessary adhesion, and polyester film as a typical carrier has an extremely smooth surface, making adhesion very difficult to control to get it just right

Method used

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  • Dry film photoresist containing adhesive additive and plasticizer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-3

[0026] These illustrations show the effect of carboxyl-modified vinyl chloride / ethylene acetate polymer concentration on the adhesion of the photopolymerizable components to polyester films. The photopolymerizable combinations in the preparation examples were prepared according to the formulations in Table 1. , the preparation of this component is to stir all the substances in a screw mixer for one hour. Then coat a liquid layer with a thickness of about 38.1um on a 23.4um polyester film, and the sample is placed in a fume hood for 4-18 hours to The solvent was evaporated and the sample was then hot pressed onto a copper foil epoxy / fiberglass substrate. The photoresist was cut into 1-inch strips with a razor blade. The peel strength was not measured. The measurement was performed by a peel test at 180°C. The instrument was INSTRON, with a load of 0.9kg. Each sample was measured at least 10 times, as listed in the report. The peel strength is the average of 10 test results. For...

Embodiment 4

[0035] Polyurethane in the present invention is prepared according to the following formula:

[0036] Table 2

[0037]

molecular weight

quantity%

Moore

polypropylene glycol 1

195

29.28

0.0294

block segment copolymer 2

996

42.63

0.0428

Dimonomethylolpropionic acid

67

2.37

0.0353

toluene diisocyanate

87.1

14.07

0.1615

2-Hydroxypropyl methacrylate

144

3.88

0.0269

[0038] 1. The weight average molecular weight is 2000, poly G55-53, produced by olin Chemical Company.

[0039] 2. The weight average molecular weight is 2000, poly G20-56, produced by olin Chemical Company, prepared from the reaction of ethylene oxide and polypropylene glycol.

[0040] The mixture of polypropylene diester, block copolymer and bishydroxycarboxylic acid was heated to about 60°C, dried with nitrogen for 12 hours, 0.015% dioctyltin bis(sulfide) dioc...

Embodiment 5

[0042] This example shows the preparation steps of the dry film of the photopolymerizable component of the present invention, which is the use method of using the polyurethane in Example 4 as a plasticizer, and the dry film is made of a photoresist in The interlayer in the polyester carrier film and the polyethylene cover film is rolled into a cylindrical shape, and the photopolymerizable component is prepared by the following parts: 77 parts of acrylate polymer (31% solid content), which is prepared by using 13% ethyl acetate Base acrylate, 65% methacrylic acid formic acid, 22% methacrylic acid, in solvent butanone, using AIBN (azobisisobutyronitrile) as initiator, polymerized at 60℃-65℃. 0.23 parts of adhesive (molecular weight 22000, partially hydrolyzed, hydroxyl modified vinyl chloride / vinyl ester copolymer, of which about 90% vinyl chloride, about 4% vinyl acetate, 2.3% hydroxyl content, name UCAR VAGD, by UMION CARBIDE produced by the company). 3% Methoxylated bispheno...

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PUM

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Abstract

The invention provides a dry film photoresist for aqueous solution development. The components thereof include a macromolecule adhesive, a free radical photoinitiator, monomers capable of having addition polymerization, a plasticizer and a thermal polymerization inhibitor. The dry film photoresist is characterized in that the components further include a carboxyl modified chloroethylene / ethylene vinyl acetate macromolecule component capable of having photopolymerization and polyurethane having a carboxylic group, so that the component capable of having photopolymerization in the various components not only keeps a delicate balance, but also ensures the just right adhesiveness control and the softness of a solidified dry film.

Description

technical field [0001] The invention relates to a dry film photoresist developed in an aqueous solution, in particular to an aqueous solution development of a photopolymerizable hydroxyl-modified vinyl chloride / ethylene acetate polymer component and a carboxyl group-containing polyurethane in the dry film photoresist. dry film photoresist. Background technique [0002] Aqueous solution developed dry film photopolymerizable components can be used as photoresists to produce printed circuit boards. In typical use, dry film photopolymerizable components can be applied to copper foil substrates, exposed in specific areas to The dry film is cured and then washed with an alkaline aqueous solution to remove the unexposed dry film on the copper plate, the exposed copper plate surface can be removed with an etching solution, and the remaining copper part protected by the cured photopolymer component, It becomes the electrical circuit. [0003] The dry film photopolymerizable dry fil...

Claims

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Application Information

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IPC IPC(8): G03F7/004G03F7/033
Inventor 邱红斌陆德凯
Owner ZHUHAI DYNAMIC TECH OPTICAL IND