LED (light-emitting diode) chip of vertical structure
A LED chip and vertical structure technology, which is applied in the field of optoelectronic information, can solve the problems of low substrate peeling yield, etc., and achieve the effects of improving chip reliability, reducing cracks, and reducing chip leakage
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Embodiment 1
[0041] figure 1 It is a flowchart of a method for manufacturing a vertically structured LED chip according to Embodiment 1 of the present invention, Figure 2~7 It is a cross-sectional view of the structure in each step of the method for manufacturing a vertical LED chip according to Embodiment 1 of the present invention.
[0042] Such as Figures 1 to 7 Shown, the manufacturing method of the LED chip of described vertical structure comprises:
[0043] S101: providing a substrate;
[0044] Such as figure 2 As shown, the material of the substrate 101 can be sapphire, silicon carbide (SiC), silicon, zinc oxide (ZnO), gallium arsenide (GaAs), spinel (MgAL 2 o 4 ), and single-crystal nitrides with lattice constants close to those of nitride semiconductors. Preferably, the substrate 101 is a sapphire substrate.
[0045] S102: forming an epitaxial layer on the substrate;
[0046] Such as figure 2 As shown, an N-type nitride 102 , a light emitting layer 103 and a P-type ni...
Embodiment 2
[0072] The difference between this embodiment and the first embodiment lies in the steps after forming the second substrate, so the steps before forming the second substrate will not be described in detail.
[0073] Combine below Figure 8 to Figure 9 Each step of the method for manufacturing a vertical LED chip according to Embodiment 2 of the present invention will be described.
[0074] Such as Figure 8 As shown, first, a substrate 201 is provided, and an N-type nitride 202, a light-emitting layer 203, and a P-type nitride 204 are sequentially formed on the substrate 201, and the N-type nitride 202, the light-emitting layer 203, and the P-type The nitrides 204 together form the epitaxial layer 205; then, sequentially form a contact layer 206, a reflective layer 207, and an anti-diffusion layer 208 on the epitaxial layer 205; then, form a first substrate 209 on the anti-diffusion layer 208; then Next, the second substrate 210 is formed on the first substrate 209 . The ab...
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