Automatic loading and unloading device for PECVD (plasma enhanced chemical vapor deposition) equipment

A technology for automatic loading and unloading and equipment, which is applied in the manufacture of electrical components, manipulators, semiconductors/solid-state devices, etc. It can solve problems such as high labor intensity, damage to graphite boats, and shortened life, so as to reduce work intensity and achieve good coating uniformity. The effect of prolonging the service life
CN102709212AActive Publication Date: 2012-10-03深圳市大族光伏装备有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
深圳市大族光伏装备有限公司
Publication Date
2012-10-03

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Abstract

The invention relates to an automatic loading and unloading device for PECVD (plasma enhanced chemical vapor deposition) equipment. The automatic loading and unloading device comprises a control module and a support. The support is provided with a boat storage workstation for storing graphite boats, a bogie, a paddle workstation and a manipulator taking and storing the graphite boats at the boat storage workstation, the bogie and the paddle workstation. The support is further provided with a horizontal moving unit and a perpendicular moving unit, wherein the horizontal moving unit is used for controlling moving of the manipulator in the horizontal direction, and the perpendicular moving unit is used for controlling moving of the manipulator in the perpendicular direction. The control module is connected with an upper computer of the PECVD equipment and used for controlling the horizontal moving unit and the perpendicular moving unit to drive the manipulator according to state signals about whether the graphite boats are on the boat storage workstation, the bogie and the paddle workstation and signals about taking and loading the graphite boats from the upper computer. The automatic loading and unloading device for the PECVD equipment is capable of accurately positioning, is high in loading and unloading efficiency, work intensity of operators is reduced, the graphite boats are protected from damage, uniformity of film plating is fine and the service lives of the graphite boats can be prolonged greatly.
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Description

technical field

[0001] The invention relates to the technical field of vacuum coating, and more specifically, relates to an automatic loading and unloading device for PECVD equipment. Background technique

[0002] In the manufacturing process of silicon solar cells, it is usually necessary to use a thin film deposition process to coat silicon wafers. For example, the plasma enhanced chemical vapor deposition (Plasma Enhanced Chemical Vapor Deposition, PECVD) process can be used to vacuum silicon nitride on silicon wafers. Coating to form an anti-reflection layer on the surface of the silicon wafer. PECVD (Plasma Enhanced Chemical Vapor Deposition) is the abbreviation of plasma-enhanced chemical vapor deposition technology. Its principle is to use low-temperature plasma as an energy source, and use glow discharge to heat up the sample on the cathode of glow discharge under low pressure besides the sample. After reaching a predetermined temperature, an appropriate amount of r...

Claims

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