Method for preparing p-type zinc oxide material
A technology of zinc oxide and zinc oxide single crystal, which is applied in chemical instruments and methods, metal material coating technology, semiconductor/solid-state device manufacturing, etc.
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[0013] In order to make the purpose, technical solution and advantages of the present invention clearer, the specific implementation manners of the present invention will be described in detail below.
[0014] Through magnetron sputtering equipment, a quartz glass substrate is used, the substrate temperature is 600°C, zinc target and oxygen are used, the sputtering power of the zinc target is 40W, the flow rate of oxygen and argon is set to 15 sccm, and the pressure of the growth chamber is set to 1Pa, the growth time is 1h, and the ZnO thin film is obtained.
[0015] The obtained ZnO thin film was placed in a high temperature and high pressure oxygen atmosphere annealing furnace for crystallization and reformation. The annealing temperature was 1200°C, the oxygen pressure was 20 standard atmospheric pressure, and the annealing time was 4 hours. A high resistance ZnO thin film material with a large number of zinc vacancies was obtained.
[0016] A ZnO thin film with a large nu...
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