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Method for manufacturing pyroelectric spectrum detector

A spectral detector and pyroelectric technology, applied in the direction of color/spectral characteristic measurement, manufacturing microstructure devices, and techniques for producing decorative surface effects, etc., can solve the problems of poor signal-to-noise ratio and low detection sensitivity of the system, Improve detection sensitivity, improve system detection sensitivity, and avoid low-frequency white noise

Inactive Publication Date: 2012-10-10
昆明斯派特光谱科技有限责任公司
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Problems solved by technology

[0011] The purpose of the present invention is to provide a method of manufacturing an integrated pyroelectric spectrum detector with practical value, which can solve the problems of current hybrid pyroelectric infrared detectors that can only work in low frequency bands, and are subject to external environments such as vibration and wind. The change has a great influence, so when it is used in the spectral energy receiving device of the gas analyzer, the system has the disadvantages of poor signal-to-noise ratio and low detection sensitivity

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  • Method for manufacturing pyroelectric spectrum detector

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[0029] The specific implementation of the present invention will be further described below in conjunction with the accompanying drawings and examples. The following examples are only used to illustrate the technical solutions of the present invention more clearly, but not to limit the protection scope of the present invention.

[0030] The technical scheme of the concrete implementation of the present invention is: Step 1, the preparation of thermal insulation structure thin film:

[0031] Using the silicon single crystal whose crystal orientation is (100) direction, volume resistivity 0.1~10Ωcm, size 20cm×20cm, surface has been thermally oxidized as the substrate, prepare inorganic-organic hybrid porous with a thickness of 1um~5um SiO 2 film.

[0032] Step 2, preparation and patterning of the lower electrode film:

[0033] According to the structural parameters of the designed device, the inorganic-organic hybrid porous SiO obtained in step 1 2 After the photolithography ...

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Abstract

The invention belongs to the technical field of photoelectric and microelectromechanical systems and relates to a method for manufacturing a pyroelectric spectrum detector, in particular to the method for manufacturing the pyroelectric spectrum detector for a poisonous and harmful gas analyzer. The pyroelectric spectrum detector is manufactured by seven steps. According to the method, inorganic-organic hybrid porous SiO2 thin film materials are utilized to serve as a thermal insulation structure, the problems that due to using a microbridge structure, an impending structure or an air gap structure to serve as the existing thermal insulation structure of an integrated device, the mechanical strength is poor, cracks, collapse and shedding easily occur, and the like can be solved, and mechanical property and shock resistance of an integrated pyroelectric spectrum detector chip are improved.

Description

technical field [0001] The invention belongs to the technical field of optoelectronics and micro-electromechanical systems, and relates to a preparation method of a pyroelectric spectrum detector, in particular to a preparation method of a pyroelectric spectrum detector used in a toxic and harmful gas analyzer. Background technique [0002] Since most of the toxic and harmful gases have a certain absorption on the spectrum of a certain band, the preparation of toxic and harmful gas analyzers can be realized based on the absorption principle of this spectrum. Generally speaking, the absorption of toxic and harmful gases on the spectrum of a certain band follows the Beer-Lambert law: [0003] P=P 0 Exp(-kcl) [0004] where P 0 is the energy generated by the light source, P is the remaining energy after passing through the gas environment to be measured, k is the absorption coefficient, l is the distance between the light source and the detector unit, and c is the gas concen...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/31B81C1/00
Inventor 李永辉易宏黄家新
Owner 昆明斯派特光谱科技有限责任公司
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