Method for preparing inverted-growth wide-spectrum absorption III-V multi-junction cell
A III-V, multi-junction cell technology for use in solar cells
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[0029] As mentioned above, in a nutshell, the present invention uses high aspect ratio dislocation trapping technology to realize InP epitaxy on GaAs materials (the lattice mismatch of the two reaches 3.81%, the thermal mismatch is small, and both are sphalerite Cubic structure, where GaAs thermal expansion coefficient 5.73*10 -6 ℃ -1 , InP thermal expansion coefficient 4.6*10 -6 ℃ -1 ), and the monolithic integration of GaAs and InP cells, and realize GaInP / GaAs / InGaAsP / InGaAs multi-junction cells on GaAs substrates by inversion growth, and then transfer them to With a cheaper substrate, a cost-effective solar cell with higher photoelectric conversion efficiency is obtained, and the preparation method is easy to implement, and can realize large-scale production of III-V multi-junction solar cells.
[0030] Further speaking, the technical scheme of the present invention is roughly as follows:
[0031]1) Use MOCVD or MBE to sequentially grow Al(Ga)As substrate peeling laye...
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