Chip integrating silicon micro microphone and complementary metal oxide semiconductor (CMOS) integrated circuit and manufacturing method of chip
A technology of integrated circuits and microphones, applied in electrical components, electrostatic transducers, microphones, sensors, etc., can solve the problems of limited MEMS microphone structure design and difficulty in the signal-to-noise ratio of MEMS microphones, so as to improve the overall performance and increase the total signal-to-noise ratio The effect of ratio gain
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[0033] Embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0034] Figure 1 to Figure 7 It is a schematic flowchart of a method for manufacturing a chip integrating a silicon micro-microphone and a CMOS integrated circuit provided by an embodiment of the present invention. Such as Figure 1 to Figure 7 As shown, the production steps are as follows:
[0035] Step 1: See figure 1 , select a silicon wafer 10, one surface of which has a first region 21 for making a CMOS integrated circuit and a second region 22 for making a silicon micro-microphone.
[0036] Step two: see also figure 1 , fabricate a CMOS integrated circuit on the first region 21 according to the standard process flow; wherein, during the field oxygen step, the other surface of the silicon wafer 10 is oxidized together, and the oxide layer is protected in the subsequent process to be used as a back surface masking layer during cavity etching, ...
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