A hard mask film layer structure and manufacturing method of a silicon germanium triode base region

Abstract

The invention discloses a germanium-silicon triode base region hard mask membrane layer structure, which comprises a silicon chip, wherein a collector region and a field isolation region are arranged on the silicon chip; a polycrystalline silicon layer and a germanium-silicon membrane layer are grown on the collector region and the field isolation region, and the germanium-silicon membrane layer is partially grown above the polycrystalline silicon layer; and an inorganic anti-reflection material layer and at least one hard mask membrane layer are grown above the germanium-silicon membrane layer. The invention further discloses a manufacturing method of the germanium-silicon triode base region hard mask membrane layer structure. Through adoption of the germanium-silicon triode base region hard mask membrane layer structure, the influence of a germanium-silicon membrane layer diffuse reflection beam to the appearance of the photoresist is reduced, the control acpability to key sizes in the production is improved, and photoetching patterns of small sizes are obtained.

Description

technical field [0001] The invention relates to the field of semiconductor integrated circuit manufacturing, in particular to a hard mask film layer structure in the base region of a germanium-silicon triode. The invention also relates to a method for manufacturing the hard mask film layer structure of the base region of the silicon germanium triode. Background technique [0002] Such as figure 1 As shown, in the semiconductor Bi-polar (bipolar) or Bi-CMOS (bipolar CMOS) process, in order to improve the frequency and speed characteristics of the device, silicon germanium (SiGe, that is, doping germanium in silicon) process will be introduced to manufacture The base area of ​​the transistor (Base). Due to the existence of strain energy in the silicon germanium thin film layer, the surface of the silicon germanium thin film layer grown by epitaxial growth becomes very rough, and the diffuse reflection of light caused by the rough surface of the silicon germanium thin film la...

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Problems solved by technology

Due to the existence of strain energy in the silicon germanium thin film layer, the surface of the silicon germanium thin film layer grown by epitaxial growth becomes very rough, and the diffuse reflection of light caused by the rough surface of the silicon germanium thin film layer will seriously affect the subsequent photolithography process. The morphology of the photoresist is deteriorated, and the size of the base poly (Base poly) becomes difficult to control, which is not conducive to the miniaturization of critical dimensions

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