Electronic tantalum powder performance improvement device

Abstract

The invention discloses an electronic tantalum powder performance improvement device which comprises a device main body, a plasma heater system, a vacuum system and a gas source and control system, wherein the device main body mainly consists of a feeding chamber, a heating chamber and a receiving chamber; the plasma heater system is used for providing a plasma arc to heat raw materials and comprises a spray gun and an energy supply and control unit; the spray gun is arranged in the heating chamber; the spraying direction of the spray gun corresponds to the falling track of the raw materials input into the heating chamber from the feeding chamber; the energy supply and control unit is matched with the spray gun; the vacuum system is at least used for generating a vacuum environment in the device main body; the vacuum system is respectively communicated with the feeding chamber, the heating chamber and the receiving chamber; and the gas source and control system is at least used for providing plasma arc gas and protection and / or balancing gas to the plasma heater system and the device main body. According to the invention, plasmas are used as a heat source; the heating temperature is high; the heating time is short; the cooling speed is high; processed tantalum powder has no caking phenomenon; no new impurities are added; the particle shape is greatly improved; the specific volume has low loss; the flowing property is good; and the withstand voltage is obviously improved.

Description

technical field [0001] The invention particularly relates to a plasma vacuum device for improving the performance of electronic tantalum powder, which belongs to the field of plasma vacuum equipment. Background technique [0002] The main use of tantalum powder is to make tantalum capacitors. In addition to the factors of capacitor manufacturing technology, the quality of tantalum powder also has a decisive impact on the performance of capacitors. At present, the technical indicators to measure the electrical performance of electronic tantalum powder are mainly purity, particle size and particle shape. It is generally believed that the lower the impurity content in tantalum powder and the higher the purity, the smaller the leakage current of the container produced, the higher the reliability and the longer the service life. The finer the tantalum powder, the more complex the particle shape, the larger the porosity, and the larger the specific surface area. Such tantalum po...

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Problems solved by technology

[0004] Usually high-temperature heat treatment is carried out in a vacuum metal furnace, but the heating time is long, the cooling is slow, the tantalum powder is sintered seriously, the specific volume loss is large, the heat treatment temperature is limited, and the surface quality of the particles is difficult to improve thoroughly, and the subsequent heat treatment of the tantalum powder must be carried out. Grinding and sieving classification, easy to bring in new impurities

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