Micro-displacement measurement method and sensing device for dual-workpiece platforms of photoetching machine

Abstract

The invention discloses a micro-displacement measurement method and a sensing device for dual-workpiece platforms of a photoetching machine and belongs to technologies of integrated circuit (IC) manufacturing, ultra precise measurement and ultra precise processing. The measurement method comprises that output Hall voltage signals of a Hall micro-displacement sensor are changed linearly along with the relative displacement of macro and micro dual-workpiece platforms, and an external detection circuit processes and synthesizes output signals of the Hall sensor to finish measurement. The device solves the problems of high-speed high-precision relative position detection of special positions such as a Chuck platform and a mask platform of a photoetching macro and micro dual driving mechanism, the device has the advantages of being free from contacts, good in linearity, high in integration level and high in portable capability, one-dimensional measurement, two-dimensional measurement or three-dimensional measurement can be achieved, and the environmental requirements of a photoetching system can be met.

Description

technical field [0001] The invention belongs to IC manufacturing and ultra-precise measurement and processing technology, and mainly relates to a micro-displacement measurement method and a sensing device for a double workpiece table of a lithography machine. Background technique [0002] Lithography is the core step in the manufacture of large-scale integrated circuits. The macro-micro dual-workpiece technology is one of the main means to improve the performance of the lithography machine. The macro-micro dual-drive technology is a large-stroke, high-precision, high-speed positioning mechanism. The external research has achieved some results. [0003] Among them, photoelectric methods such as grating scales and laser interferometers have been used in double-workpiece stages through closed-loop feedback control: in August 2001, an article entitled "Large Stroke Control and Research of High-precision Pole Positioning Workbench", the workbench uses a single-frequency laser in...

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Problems solved by technology

[0005] The present invention aims at the deficiencies in the above-mentioned prior art, and proposes a high-speed and high-precision micro-displacement measurement method and a sensing device for the double workpiece table of the lithography machine, so as to solve the problem of the Chuck table, the macro and micro double workpiece table of the lithography machine The monitoring problem of special positions such as the mask table achieves the purpose of simple structure, high integration, easy installation, high flexibility and fast response

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