Method for depositing a thin layer and product thus obtained
A thin layer and stacked layer technology, applied in chemical instruments and methods, coatings, metal material coating processes, etc., can solve problems such as expensive, increase the number of production line breaks, not adequately controlled, etc.
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Embodiment 1
[0086] Substrates made of soda lime silica glass obtained by the float process and subsequently cut so as to have dimensions of 3 m wide by 6 m long were coated in known manner with a thin titanium dioxide layer of thickness 10 nm by magnetron sputtering. In a first example, a 20 nm thick silicon dioxide layer was inserted between the substrate and the titanium dioxide layer (sample A). In a second example, a titanium dioxide layer was deposited directly on the substrate (sample B).
[0087] Between the outlet of the magnetron sputtering line and the storage device, a device is inserted, which consists of:
[0088] - Emission is focused on TiO 2 layer on the 10.6-micron wavelength radiation of the CO 2 a laser with a spot width of about 0.3-0.5 mm; and
[0089] - A system for moving the laser rapidly (at about 3-5 m / s) in a direction perpendicular to the direction of travel of the substrate.
[0090] The temperature of the glass substrate during processing does not exceed ...
Embodiment 2
[0097] A substrate made of soda lime silica glass obtained by procédé float and subsequently cut so that its dimensions are width 3 m x length 6 m is covered in a known manner with a thin layer comprising a silver layer by the magnetron sputtering method Stacked layers, the silver layer provides low emissive properties to the glass.
[0098] This build-up comprises, in order (from substrate to outer surface), said oxide, metal or nitride layers, the geometrical thicknesses being indicated in parentheses:
[0099] Glass / SnO 2 (20nm) / ZnO(15nm) / Ag(8.5nm) / Ni-Cr / ZnO (15nm) / Si 3 N 4 (25nm).
[0100] Interposed between the outlet of the magnetron sputtering line and the storage unit, it consists of:
[0101] -YAG doped with neodymium (yttrium aluminum garnet, Y 2 Al 15 o 2 ) a laser that emits radiation with a wavelength of 1.09 microns focused onto the silver layer in a continuous or pulsed manner, with a spot width of about 0.3-0.5 mm; and
[0102] - A system for moving the...
Embodiment 3
[0113] In this example, the same covered substrate as in Example 2 was used, thus covered with a buildup layer comprising a silver layer.
[0114] The heating method is induction heating, using inductors whose geometries are especially suitable for the treatment of flat surfaces. The frequency is 2MHz and the power can vary around several kW.
[0115] The temperature of the glass substrate during processing (which lasts only a few seconds) does not exceed 150°C.
[0116] Table 3 below shows the changes in properties described in the case of Example 2.
[0117] table 3
[0118]
[0119] Changes in squared resistance and emissivity, which are quite comparable to those induced by infrared laser treatment, also demonstrate an increase in the crystallinity of the silver layer.
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