Processing method of high-purity niobium material residual resistivity test samples
A technology for residual resistance and test samples, which is applied in the field of processing high-purity niobium material residual resistivity test samples, can solve the problems of sample pollution, sample oxidation, and inability to effectively reflect the true performance of samples, so as to avoid contamination of samples and avoid deviation , the effect of solving the pollution problem
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Embodiment 1
[0013] 1. Mix phosphoric acid, nitric acid and hydrofluoric acid in a molar ratio of 0.032:0.032:0.050 and stir evenly.
[0014] 2. Cool the mixed acid solution to 8°C-12°C.
[0015] 3. Place the high-purity niobium material sample in the cooled acid solution for 2-4 minutes.
[0016] 4. Rinse the sample with 5-18 megohm pure water for 1-2 minutes.
Embodiment 2
[0018] 1. Mix phosphoric acid, nitric acid and hydrofluoric acid in a molar ratio of 0.100:0.130:0.030 and stir evenly.
[0019] 2. Cool the mixed acid solution to 8°C-12°C.
[0020] 3. Place the high-purity niobium material sample in the cooled acid solution for 2-4 minutes.
[0021] 4. Rinse the sample with 5-18 megohm pure water for 1-2 minutes.
Embodiment 3
[0023] 1. Mix phosphoric acid, nitric acid and hydrofluoric acid in a molar ratio of 0.130:0.130:0.030 and stir evenly.
[0024] 2. Cool the mixed acid solution to 8°C-12°C.
[0025] 3. Place the high-purity niobium material sample in the cooled acid solution for 2-4 minutes.
[0026] 4. Rinse the sample with 5-18 megohm pure water for 1-2 minutes.
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