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Processing method of high-purity niobium material residual resistivity test samples

A technology for residual resistance and test samples, which is applied in the field of processing high-purity niobium material residual resistivity test samples, can solve the problems of sample pollution, sample oxidation, and inability to effectively reflect the true performance of samples, so as to avoid contamination of samples and avoid deviation , the effect of solving the pollution problem

Active Publication Date: 2013-03-20
NINGXIA ORIENT TANTALUM IND +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During the machining process, the sample will be polluted due to tool wear, and there is a certain degree of heat release during machining, which will cause the oxidation of the sample.
Therefore, a layer of pollution layer will be formed on the surface of the sample, which will greatly affect the test results of high-purity niobium material samples, and cannot effectively reflect the true performance of the sample

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0013] 1. Mix phosphoric acid, nitric acid and hydrofluoric acid in a molar ratio of 0.032:0.032:0.050 and stir evenly.

[0014] 2. Cool the mixed acid solution to 8°C-12°C.

[0015] 3. Place the high-purity niobium material sample in the cooled acid solution for 2-4 minutes.

[0016] 4. Rinse the sample with 5-18 megohm pure water for 1-2 minutes.

Embodiment 2

[0018] 1. Mix phosphoric acid, nitric acid and hydrofluoric acid in a molar ratio of 0.100:0.130:0.030 and stir evenly.

[0019] 2. Cool the mixed acid solution to 8°C-12°C.

[0020] 3. Place the high-purity niobium material sample in the cooled acid solution for 2-4 minutes.

[0021] 4. Rinse the sample with 5-18 megohm pure water for 1-2 minutes.

Embodiment 3

[0023] 1. Mix phosphoric acid, nitric acid and hydrofluoric acid in a molar ratio of 0.130:0.130:0.030 and stir evenly.

[0024] 2. Cool the mixed acid solution to 8°C-12°C.

[0025] 3. Place the high-purity niobium material sample in the cooled acid solution for 2-4 minutes.

[0026] 4. Rinse the sample with 5-18 megohm pure water for 1-2 minutes.

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Abstract

The invention relates to a processing method of high-purity niobium material residual resistivity test samples. The processing method is characterized in that high-purity niobium material samples are placed into mixed acid liquor to be soaked for 2-4min and then are washed through pure water, wherein the mixed acid liquor is formed by mixing phosphoric acid, nitric acid and hydrofluoric acid with the mole ratio to be (0.032-0.130):(0.032-0.130): (0.025-0.050). The processing method can effectively solve the pollution problem of the high-purity niobium material samples in the machining process, effectively removes oxides on the surfaces of high-purity niobium materials and ferrum, nickel and other elements caused by cutter abrasion, and avoids deviation of the measurement result and the true value of the high-purity niobium material residual resistivity.

Description

technical field [0001] The invention relates to the technical field of nonferrous metal production, in particular to a method for processing a high-purity niobium material residual resistivity test sample. Background technique [0002] The Residual Resistivity Ratio (RRR value) of high-purity niobium is defined as the ratio between the resistivity of superconducting niobium at room temperature (300K) and the resistivity of superconducting niobium at low temperature (4.2K). ratio. The resistivity of metals is related to temperature. For pure metals, when the temperature is high, the lattice vibration is more intense, and the scattering of electrons is larger. The resistance is mainly determined by the lattice scattering. At this time, the resistivity ρ is related to the thermodynamic temperature T is proportional to. As the temperature decreases, the vibration amplitude of the atoms located in the metal lattice decreases, the scattering cross section of the lattice to free ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01R27/02G01N1/30G01N1/34
Inventor 赵红运刘云峰陈明伦张宁峰张良玉黄俊峰范青游雨松
Owner NINGXIA ORIENT TANTALUM IND