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Liquid photosensitive imaging alkali development anti-anodizing ink and preparation method thereof

A technology of anodic oxidation and alkali development, which is applied in the field of ink, can solve the problems of low resolution, poor acid and strong alkali resistance, poor oxidation resistance, etc., and achieve simple synthesis operation process and good anti-sandblasting performance. Effect

Inactive Publication Date: 2016-05-11
VITAYON FINE CHEM SCI & TECH CO LTD SHENZHEN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the graphics obtained by this process have low resolution, poor resistance to sandblasting, acid and strong alkali, and poor oxidation resistance.

Method used

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  • Liquid photosensitive imaging alkali development anti-anodizing ink and preparation method thereof
  • Liquid photosensitive imaging alkali development anti-anodizing ink and preparation method thereof
  • Liquid photosensitive imaging alkali development anti-anodizing ink and preparation method thereof

Examples

Experimental program
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Effect test

preparation example Construction

[0025] The preparation method of the liquid photosensitive imaging alkali development anti-anodizing ink of the present invention comprises the following steps:

[0026] A. Prepare raw materials: Prepare 30-50 parts of alkali-soluble photosensitive resin, 5-15 parts of epoxy acrylate resin, 10-20 parts of reactive diluent, 5-15 parts of solvent, 1-10 parts of photoinitiator, 1-3 parts of auxiliary agents, 20-40 parts of fillers and 0.5-0.8 parts of pigments, wherein the alkali-soluble photosensitive resin is acid anhydride modified novolak epoxy acrylate, when preparing the acid anhydride modified novolak epoxy acrylate Prepare according to parts by weight: 35-50 parts of epoxy resin, 20-40 parts of DBE, 15-20 parts of acrylic acid, 8-15 parts of maleic anhydride, 0.5-1 part of hydroquinone, 0.5-1 part of tetraethyl ammonium bromide;

[0027] B. Preparation of anhydride-modified novolac epoxy acrylate: heat and dissolve the epoxy resin in step A with 20-40 parts of DBE, add i...

specific Embodiment

[0030] The following are three self-made methods of photosensitive resin A, B, and C:

[0031] The synthetic method of photosensitive resin A is:

[0032] Take 40 parts of F-43 novolac epoxy resin, heat and dissolve with 30 parts of DBE, add it into a three-necked flask with a reflux condenser and a stirrer, add 0.5 parts of hydroquinone and 0.5 parts of tetraethylammonium bromide, After heating to 110°C and stabilizing at constant temperature, add 18 parts of acrylic acid dropwise with a constant pressure funnel, control the dropwise addition within 1 hour, stir and react for more than 2 hours, then add 11 parts of maleic anhydride and react for 5 hours to obtain photosensitive resin A.

[0033] The synthetic method of photosensitive resin B is:

[0034] Take 50 parts of JF-43 o-cresol type epoxy resin, heat and dissolve with 20 parts of DBE, put it into a three-necked flask with a reflux condenser and a stirrer, add 1 part of hydroquinone and 1 part of tetraethyl bromide A...

Embodiment 7 to 9

[0044]

[0045] Mix the raw materials of the above-mentioned Examples 1 to 9 and use a three-roller machine to form a blue ink with a fineness of 10 μ and a viscosity of 195 dpa.s (25° C.). The resulting ink has good performance. Ink film hardness 4H, adhesion 5B. Anti-sandblasting 2kgf / cm 2 , no shedding. Anti-anodization ink is intact, no drop. From the above-mentioned examples and the results of performance tests, it can be concluded that the liquid photosensitive imaging alkali-developing anti-anodizing ink prepared by the above-mentioned ratio and the above-mentioned method is screen-printed or sprayed on the surface of an aluminum material, and baked at 90-100°C for 15-30 Make the surface dry for 10 minutes, stick the film tightly, expose it under the ultraviolet light, and then use 0.5-0.8% Na 2 CO 3 Develop with aqueous solution for 30-60 seconds, then pass through UV machine at 800-1500mj / cm 2 After curing, the formed ink film is resistant to sandblasting, str...

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Abstract

The invention discloses a liquid photo-imageable alkali developable and anodizing resistant ink and a preparation method of the liquid photo-imageable alkali developable and anodizing preventive ink. The liquid photo-imageable alkali developable and anodizing resistant ink comprises the following components in parts by weight: 30 to 50 parts of photosensitive resin, 5 to 15 parts of epoxy acrylic resin, 10 to 20 parts of reactive diluent, 5 to 15 parts of solvent, 1 to 10 parts of photoinitiator, 1 to 3 parts of assistant, 20 to 40 parts of filler, and 0.5 to 0.8 part of pigment; the alkali soluble photosensitive resin is manufactured from the following raw materials in parts by weight: 35 to 50 parts of epoxy resin, 20 to 40 parts of DBE (Dibasic Ester), 15 to 20 parts of crylic acid, 8 to 15 parts of maleic anhydride, 0.5 to 1 part of hydroquinone, and 0.5 to 1 part of tetraethylammonium bromide. The liquid photo-imageable alkali developable and anodizing resistant ink is high in sand blasting resistance, strong alkali resistance, strong acid resistance, anodizing resistance and resolution ratio and image resolution, has no corrosion to the surface of IXEF (Aramids) substrate and remains the colour of the surface, and can be quickly and completely stripped from a composite substrate.

Description

technical field [0001] The present invention relates to inks, in particular to liquid photosensitive imaging alkali-developable anti-anodizing inks. [0002] The present invention also relates to a preparation method of the liquid photosensitive imaging alkali development anti-anodizing ink. Background technique [0003] In order to enhance the weather resistance and corrosion resistance of aluminum or aluminum alloy, prolong its service life and increase its aesthetics, it is usually necessary to carry out surface treatment on aluminum or aluminum alloy materials. There are many kinds of metal surface treatment technologies, such as electroless plating, anodizing, coating technology and so on. The most effective method is to perform one-time anodic oxidation coloring directly on the aluminum alloy surface. This anodic oxidation coloring technology is basically used in building materials. However, in order to adapt to the multi-color and LOGO (logo) display requirements of...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09D11/101G03F7/027G03F7/004
Inventor 朱婉平马万文
Owner VITAYON FINE CHEM SCI & TECH CO LTD SHENZHEN
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