Antifoaming agent
A defoamer and mass fraction technology, applied in the field of defoamer, can solve the problems of affecting the basic properties of the foaming system, unstable chemical properties, poor defoaming effect, etc., achieving good inhibition performance and no adverse side effects. , the effect of high safety
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0008] A defoamer, comprising the following raw materials in parts by mass: 1 part of potassium iodide, 2 parts of boric acid, 1 part of sodium bromide, 2 parts of calcium stearate, 4 parts of nonylphenol polyoxyethylene ether, tetrabutyl bromide 2 parts of phosphorus, 1 part of benzyltriphenylphosphine bromide, 3 parts of isopentenol, 4 parts of tert-pentane chloride, 1 part of thulium trifluoroacetylacetonate and 3 parts of simethicone.
Embodiment 2
[0010] A defoamer, comprising the following raw materials in parts by mass: 3 parts of potassium iodide, 5 parts of boric acid, 4 parts of sodium bromide, 4 parts of calcium stearate, 8 parts of nonylphenol polyoxyethylene ether, tetrabutyl bromide 6 parts of phosphorus, 5 parts of benzyltriphenylphosphine bromide, 6 parts of isopentenol, 7 parts of tert-pentane chloride, 2 parts of thulium trifluoroacetylacetonate and 9 parts of simethicone.
Embodiment 3
[0012] A defoamer, comprising the following raw materials in parts by mass: 2 parts of potassium iodide, 3.5 parts of boric acid, 2.5 parts of sodium bromide, 3 parts of calcium stearate, 6 parts of nonylphenol polyoxyethylene ether, tetrabutyl bromide 4 parts of phosphorus, 3 parts of benzyltriphenylphosphine bromide, 4.5 parts of isopentenol, 5.5 parts of tert-pentane chloride, 1.5 parts of thulium trifluoroacetylacetonate and 6 parts of simethicone.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com