A method of manufacturing a film capacitor with a composite substrate
A technology of thin film capacitors and composite substrates, applied in thin film/thick film capacitors, stacked capacitors, fixed capacitor electrodes, etc., can solve problems such as increased leakage current, insufficient purity, and defects in the combination of thin film capacitors and printed circuit boards
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Embodiment 1
[0021] see figure 1 , the manufacturing method of the film capacitor with composite substrate comprises the steps in turn:
[0022] (1) Prepare raw materials with the following ratio: nickel greater than or equal to 99.98% by weight. The remaining 0.02% by weight is various impurities. The various impurities include: 0.0005-0.0008% by weight of manganese, 0.005-0.008% by weight of aluminum, 0.001-0.002% by weight of silver, 0.0005-0.001% by weight of chromium, 0.004-0.006% by weight of iron, 0.0005-0.0012 % by weight of silicon and 0.001-0.002% by weight of antimony and 0.001-0.002% by weight of tantalum;
[0023] (2) Rolling for the first time: after the above-mentioned raw material is melted, it is rolled for the first time, and the nickel substrate obtained by the rolling for the first time is a foil shape, and its thickness is 3-5 millimeters;
[0024] (3) thermal annealing for the first time, the nickel substrate foil obtained in step (2) is thermally annealed for the ...
Embodiment 2
[0035] see figure 1 , the manufacturing method of the film capacitor with composite substrate comprises the steps in turn:
[0036] (1) Prepare raw materials with the following ratio: nickel greater than or equal to 99.98% by weight. The remaining 0.02% by weight is various impurities. The various impurities include: 0.0005-0.0008% by weight of manganese, 0.005-0.008% by weight of aluminum, 0.001-0.002% by weight of silver, 0.0005-0.001% by weight of chromium, 0.004-0.006% by weight of iron, 0.0005-0.0012 % by weight of silicon and 0.001-0.002% by weight of antimony and 0.001-0.002% by weight of tantalum;
[0037] (2) Rolling for the first time: after the above-mentioned raw material is melted, it is rolled for the first time, and the nickel substrate obtained by rolling for the first time is a foil shape, and its thickness is 4 millimeters;
[0038] (3) Thermal annealing for the first time, the nickel substrate foil obtained in step (2) is thermally annealed for the first ...
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