High heat conductivity insulation composite and preparation method thereof
An insulating composite material and a composite material technology are applied in the field of high thermal conductivity insulating composite materials and their preparation, which can solve the problems of low dielectric constant, unsuitable high thermal conductivity and the like, and achieve the effect of low dielectric constant.
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Embodiment 1
[0020] The preparation method of the high thermal conductivity insulating composite material comprises the following steps:
[0021] Step 1: prepare diamond / copper composite material sample, the volume ratio of diamond and copper is 65%: 1, it is processed into Generally speaking, the shape of the composite material sample is not limited, and it is not limited to any thickness, but the preferred thickness is above 3mm;
[0022] Step 2: Coarse grinding, fine grinding, rough polishing, and fine polishing of the high thermal conductivity composite material sample;
[0023] Step 3: Use ion implantation technology to inject a carbon layer on the surface of the high thermal conductivity composite material sample; the carbon layer is used as a transition layer, and the thickness is less than 1m, usually tens of nanometers;
[0024] Step 3: Deposit an insulating AlN film on the surface of the high thermal conductivity composite material with a thickness of 100 μm by using magnetron ...
Embodiment 2
[0027] The difference between this example and Example 1 is that the insulating film is prepared by CVD technology, the chemical vapor deposition rate exceeds 10 μm / hour, and the thickness is 100 μm. Other preparation steps are the same as in Example 1.
[0028] The composite material Tanδ≤6.8×10 after depositing the diamond film -2 (1MHz), the volume resistivity is 10 9 Ωcm, thermal conductivity 560W / mK.
Embodiment 3
[0030] The difference between this example and Example 1 is that the insulating film uses AlN and CVD diamond composite film, first deposits a 50 μm AlN film, and then deposits a 50 μm diamond film, and the chemical vapor deposition rate exceeds 10 μm / hour. 1 is the same. After depositing the composite film, the volume resistivity is 10 11 Ωcm, dielectric loss Tanδ≤6.3×10 -3 (1MHz), thermal conductivity 480W / mK.
[0031] In the preparation method of the present invention, in addition to the diamond / copper used in the embodiment, the high thermal conductivity composite material can also use carbon fiber / copper, diamond mixed particles / copper, carbon fiber mixed particles / copper, diamond / aluminum, diamond / silver and other particles Or fiber-reinforced copper, aluminum or silver high thermal conductivity, low expansion composite material; Insulation layer can also use boron nitride except aluminum nitride film, diamond film and diamond and aluminum nitride composite film adopte...
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