Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Cutting tool comprising multilayer coating

A cutting tool and multi-layer coating technology, applied in the field of cutting tools, can solve problems such as insufficient temperature resistance, and achieve the effects of reducing thermal conductivity, high hardness value, and good high-temperature properties

Active Publication Date: 2013-07-10
WALTER AG
View PDF4 Cites 18 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Neither titanium carbide nor titanium nitride has sufficient temperature resistance for use where high temperature loads are involved

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0026] Layer A: TiAlN

[0027] PVD Process: Arc Vapor Deposition (Arc-PVD)

[0028] Target: Ti / Al (33 / 67 atomic percent), circular source (63mm diameter)

[0029] Deposition: temperature: 500°C; evaporator current: 65 amps;

[0030] 3.2Pa nitrogen pressure, 50V substrate bias voltage

[0031] Layer B: Si 3 N 4

[0032] PVD process: double magnetron sputtering

[0033] Target: rectangular silicon source (80cm×20cm)

[0034] Deposition: Temperature: 500°C; 6W / cm 2 ; 200 sccm of nitrogen;

[0035] 0.5Pa argon pressure; 90V substrate bias voltage

[0036] Structural X-ray, amorphous

[0037] Bonding Character: Covalent according to XPS analysis

[0038] Layer sequence: bulk / 2.5 μm TiAlN / 0.6 μm Si 3 N 4

example 2

[0045] The TiAlN layer and the silicon nitride layer B were deposited with the same PVD process and the same parameters as in Example 1.

[0046] Layer sequence: bulk / 2.5 μm TiAlN / 0.6 μm Si 3 N 4 / 0.3μm TiAlN / 0.1μm Si 3 N 4 / 0.3μm TiAlN / 0.1μm Si 3 N 4 .

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to a cutting tool comprising a main part and a multilayer coating applied thereon. A first layer A made of a hard material is applied on the main part, said hard material being selected from titanium aluminum nitride (TiAIN), titanium aluminum silicon nitride (TiAISiN), chromium nitride (CrN), aluminum chromium nitride (AICrN), aluminum chromium silicon nitride (AICrSiN), and zirconium nitride (ZrN), and a second layer B made of silicon nitride (Si3N4) is applied directly over the first layer A.

Description

[0001] The invention relates to a cutting tool comprising a body and a multilayer coating applied to the body. Background technique [0002] Cutting tools comprise a body made of, for example, hard metal, ceramics, steel or high speed steel, and a single or multiple coatings of hard material applied to said body to prolong life or to also Improve cutting performance. The hard material coating is applied using a CVD (Chemical Vapor Deposition) process and / or a PVD (Physical Vapor Deposition) process. [0003] WO 96 / 23911 describes a cutting tool comprising a multilayer wear-resistant coating with a plurality of individual layers, wherein the individual layer comprising a hard metal material is applied directly to the main body, further, in the A plurality of monolayers are arranged on the body such that these monolayers form a periodically repeating composite of three different corresponding monolayers, each comprising two different layers of metallic hard material and a Cova...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C28/00C23C30/00
CPCC23C28/042C23C28/044C23C28/322C23C28/34C23C28/345C23C28/3455C23C28/347C23C30/005Y10T428/24975Y10T428/265B23B27/14C23C28/00C23C30/00
Inventor 法伊特·席尔
Owner WALTER AG
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products