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Method for preparing low-reflectivity metallic thin film

A metal thin film and low reflectivity technology, which is applied in the preparation of low reflectivity thin films and the field of preparation of low reflectivity metal thin films, can solve the problems of high surface reflectivity of metal film layers and large differences in film layers, so that it is not easy to oxidize, Easy to etch effect

Inactive Publication Date: 2013-08-28
BEIJING INST OF CONTROL ENG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The surface reflectance of the metal film layer prepared by the ordinary coating process is relatively high, and the film layer of different materials varies greatly. At 80% to 90%; unable to meet the requirements of special tasks, the research topic of preparing low-reflectivity films by magnetron sputtering was carried out.

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  • Method for preparing low-reflectivity metallic thin film
  • Method for preparing low-reflectivity metallic thin film

Examples

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Effect test

Embodiment 1

[0024] The thickness of the low-reflectivity chromium film required to be prepared is: 600nm, and the preparation method is:

[0025] 1) Process the quartz glass substrate into a rectangular plate with a size of 20mm×20mm as required, then clean the quartz glass substrate, and finally put the quartz glass substrate into the vacuum chamber of the vacuum coating machine;

[0026] The cleaning method is as follows: wipe the substrate with calcium carbonate, rinse it with water, soak it in glass washing solution for 2 hours, take it out and rinse it with deionized water, dehydrate it with absolute ethanol, and use 50% absolute ethanol plus the mass content Wipe clean with 50% ether lotion;

[0027] 2) Prepare a low-reflectivity chromium film on a quartz glass substrate by magnetron sputtering, the steps are:

[0028] (a) Vacuumize the vacuum chamber of the vacuum coating machine, and heat the quartz glass substrate to 120°C;

[0029] (b) When the vacuum degree of the vacuum cham...

Embodiment 2

[0036] The thickness of the low-reflectivity tantalum film required to be prepared is: 400nm, and the preparation method is:

[0037] 1) Process the quartz glass substrate into a rectangular plate with a size of 20mm×20mm as required, then clean the quartz glass substrate, and finally put the quartz glass substrate into the vacuum chamber of the vacuum coating machine;

[0038] The cleaning method is as follows: wipe the substrate with calcium carbonate, rinse it with water, soak it in glass washing solution for 2 hours, take it out and rinse it with deionized water, dehydrate it with absolute ethanol, and use 50% absolute ethanol plus the mass content Wipe clean with 50% ether lotion;

[0039] 2) Prepare a low-reflectivity tantalum film on a quartz glass substrate by magnetron sputtering, the steps are:

[0040] (a) Vacuumize the vacuum chamber of the vacuum coating machine, and heat the quartz glass substrate to 120°C;

[0041] (b) When the vacuum degree of the vacuum cham...

Embodiment 3

[0048] The thickness of the low-reflectivity aluminum film required to be prepared is: 450nm, and the preparation method is:

[0049] 1) Process the quartz glass substrate into a rectangular plate with a size of 20mm×20mm as required, then clean the quartz glass substrate, and finally put the quartz glass substrate into the vacuum chamber of the vacuum coating machine;

[0050] The cleaning method is as follows: wipe the substrate with calcium carbonate, rinse it with water, soak it in glass washing solution for 2 hours, take it out and rinse it with deionized water, dehydrate it with absolute ethanol, and use 50% absolute ethanol plus the mass content Wipe clean with 50% ether lotion;

[0051] 2) Prepare a low-reflectivity aluminum film on a quartz glass substrate by magnetron sputtering, the steps are:

[0052] (a) Vacuumize the vacuum chamber of the vacuum coating machine, and heat the quartz glass substrate to 120°C;

[0053] (b) When the vacuum degree of the vacuum cham...

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Abstract

The invention relates to a method for preparing a low-reflectivity metallic thin film, and particularly relates to a method which is used for preparing the low-reflectivity metallic thin film on the surface of optical glass, is suitable for preparation of the low-reflectivity metallic thin film adopted by optical elements such as coded discs and optical gratings for spacecrafts, and belongs to the technical field of thin film preparation. The reflectivity of the metallic thin film prepared by the method is less than or equal to 10%. The method can be used for preparing the low-reflectivity metallic thin film adopted by the optical elements such as the coded discs, cylindrical mirrors, and optical incidence seam plates. A reactant gas is used in the preparation process, so that the film does not contain gas and is difficult to oxide and easy to etch.

Description

technical field [0001] The present invention relates to a method for preparing low-reflectivity metal thin films, in particular to a method for preparing low-reflectivity thin films on the surface of optical glass, which is suitable for the preparation of low-reflectivity thin films used in spacecraft optical parts such as code discs and gratings The preparation belongs to the technical field of thin film preparation. Background technique [0002] The integrated photoelectric assembly, the core component of the digital sun sensor in the satellite control system, is composed of a code disc, a cylindrical mirror, and an integrated photocell; the windows of the code disc and the optical slits of the cylindrical mirror are etched on the metal film layer. For the optical probe of the analog sun sensor, the light slits of the optical incident slit plate are also etched on the metal film layer. In order to reduce the error caused by the secondary reflection of the incident light, ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/09
Inventor 刘江秦素然高修涛石建民范汉超王婧烨赵娜
Owner BEIJING INST OF CONTROL ENG