Preparation method for hollow silica microspheres
A hollow silicon dioxide, silicon dioxide technology, applied in the directions of silicon dioxide, silicon oxide, electrical components, etc., can solve the problems of limited protection effect of surface protection agent, volume expansion, etc., achieves low equipment requirements, easy operation, and benefits wetting effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0041] A method for preparing hollow silicon dioxide, the general technical scheme includes the following steps.
[0042] (1) Prepare 0-5 mol / L potassium hydroxide and 0-5 mol / L lithium hydroxide mixed lye, and add a surfactant to control the corrosion rate and a liquid to control the wetting ability of the solution to the silica microspheres Additives, then add commercial spherical silica, stir, and then ultrasonically disperse. Then react at a water bath temperature of 25-80° C. for 1-48 hours to obtain a white deposit.
[0043] (2) The sediment obtained in step (1) is vacuum filtered, washed with deionized water, and then dried in an oven at 80-150° C. for 1-48 hours.
[0044] Among them, the additives for controlling the corrosion rate are preferably hexamethylenetetramine, sodium dodecylsulfonate, and Tween, and the content is in the range of 0.0005-1 mol / L.
[0045] Among them, the liquid additives for regulating the wettability of the solution to the silica microspher...
Embodiment 1
[0049] Prepare 50 mL of mixed lye of 0.5 mol / L potassium hydroxide and 0.5 mol / L lithium hydroxide, add 0.1 mol / L hexamethylenetetramine and 3 mL of ethanol. Then weigh 1 g of silicon dioxide, add it into the etching solution, stir evenly, and ultrasonically disperse. After that, the reaction was carried out at a water bath temperature of 75° C. for 17 h. The product was collected by filtration, washed with deionized water several times, and then dried in an oven at 100° C. for 1 h to obtain 0.8043 g of the product. Finally, the shape analysis of the sample was carried out, and the results are shown in figure 1 , figure 1 It is shown that a large number of hollow structures are produced, and the shells of the hollow structures are porous.
Embodiment 2
[0051] Improve the concentration of potassium hydroxide to 0.8mol / L, and others are identical with embodiment 1. The final product yield was 0.7448 g. product description see figure 2 , figure 2 It is shown that a large number of hollow structures are produced.
PUM
| Property | Measurement | Unit |
|---|---|---|
| diameter | aaaaa | aaaaa |
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More