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Polyol polymer photosensitive resist and preparation method thereof

A technology of photosensitive glue and photosensitive agent, which is applied in the field of photosensitive glue, can solve the problems of uneven coating, poor solubility, easy cracking and foaming of photosensitive glue, and achieve the goal of saving defoaming time, shortening dissolution time and reducing foam The effect produced

Active Publication Date: 2013-11-13
CHINA PETROCHEMICAL CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The PVA brand used for photosensitive adhesive is PVA-1788. In the actual use process, there is still a high viscosity, which makes the photosensitive adhesive unevenly coated in subsequent applications, easy to crack and foam, poor solubility, and developing during the development process. Disadvantages of longer time

Method used

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  • Polyol polymer photosensitive resist and preparation method thereof
  • Polyol polymer photosensitive resist and preparation method thereof
  • Polyol polymer photosensitive resist and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] Weigh each substance as follows:

[0024]

[0025] First, slowly add polyvinyl alcohol PVA-1788 into a jacketed stirring tank with 30 kg of cold water, gradually raise the temperature to 80°C, then stir for 30 to 80 minutes to fully dissolve the polyvinyl alcohol, filter out impurities after dissolution, and cool for later use; Dissolve ammonium dichromate in the remaining water, filter out impurities, mix with dissolved polyvinyl alcohol solution in a preparation tank, add defoamer, and stand for 6-7 hours.

[0026] The photosensitive adhesive obtained above has a lower viscosity than the usual photosensitive adhesive, and is more evenly coated on the steel strip. The technical problems such as uneven coating, easy cracking and foaming caused by too high. The prepared photosensitive adhesive is used in the development process, and the uncured part after drying has good solubility, the development time is shortened by 30%, and the temperature of the developer is als...

Embodiment 2

[0028]

[0029] Add 32kg of cold water into the stirring kettle, start stirring, then slowly add the polyvinyl alcohol PVA-1088 into the kettle, stir for about 5 minutes, raise the water temperature to 80°C within 10 minutes, keep stirring at a constant temperature of 60 Minutes, cool to get the colloid for use; dissolve ammonium dichromate in the remaining water, filter out impurities, mix with dissolved polyvinyl alcohol solution in the preparation tank, add defoamer, and stand for 4-5 Available in hours.

[0030] The photosensitive adhesive obtained above has a lower viscosity than the usual photosensitive adhesive, and is more evenly coated on the steel strip. The technical problems such as uneven coating, easy cracking and foaming caused by too high. The prepared photosensitive adhesive is used in the development process, and the uncured part after drying has good solubility, the development time is shortened by 50%, and the temperature of the developer is also approp...

Embodiment 3

[0032]

[0033]

[0034] First, slowly add polyvinyl alcohol PVA-1388 into a jacketed stirring tank with 50 kg of cold water, gradually raise the temperature to 85°C, and then stir for 80 minutes to fully dissolve the polyvinyl alcohol. After the dissolution is completed, filter out impurities and cool for later use; Dissolve ammonium chromate in the remaining water, filter out impurities, mix with dissolved polyvinyl alcohol solution in a preparation tank, add defoamer, and let it stand for 5 hours.

[0035] The photosensitive adhesive obtained above has a lower viscosity than the usual photosensitive adhesive, and is more evenly coated on the steel strip. The technical problems such as uneven coating, easy cracking and foaming caused by too high. During the development process of the prepared photosensitive adhesive, the uncured part after drying has good solubility, the development time is shortened by 40%, and the temperature of the developer is also appropriately re...

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Abstract

A photosensitive resist is prepared through using 5-30 parts of a colloid, 0.1-0.7 parts of a photosensitive agent, 30-80 parts of water and 0.01-0.05 parts of an antifoaming agent; the colloid comprises one or more of polyvinyl alcohols having a polymerization degree of 300-2000 and an alcoholysis degree of 80-99mol%; the photosensitive agent is ammonium dichromate or comprises one or more of diazo compounds comprising diphenylamino-4-diazo salt, trimethoxy-4-diazodiphenylamino salt, a diphenylamino-4-diazo salt grafted compound, a trimethoxy-4-diazodiphenylamine compound, 2-diazo-1-naphthoquinone-4-sulfonyl chloride and the like and is processed to prepare an aqueous solution having a mass percentage concentration of 3-7%; and the antifoaming agent is a water-based organosilicon modified emulsion-like antifoaming agent. The obtained photosensitive resist has a lower viscosity than general photosensitive resists, steel band can be uniformly coated by the photosensitive resist, there are no spots after the coating of photosensitive resist on the steel band visually, and the technical problems of easy cracking, easy foaming and the like caused by the too high viscosity of present photosensitive resists in the subsequent application are effectively avoided.

Description

technical field [0001] The invention relates to a photosensitive adhesive, in particular to a photosensitive adhesive with low viscosity and good solubility and a preparation method thereof; it is especially suitable for use in cathode ray tube shadow masks, high-definition plasma display shadow masks, metal speaker net covers, electronic Production of product metal plates, ultra-fine filter screens, etc. Background technique [0002] The main components of photosensitive glue are colloid and photosensitive agent. The colloid is coated on the carrier to form a thin film. Under the irradiation of ultraviolet light, the photosensitizer and colloid molecules undergo a complex photochemical reaction, so that the photosensitive colloid is transformed into an insoluble substance. Through the development of the colloidal film The desired pattern / area remains. [0003] Currently used colloids include gelatin (bone glue), protein, PVA (polyvinyl alcohol) and other water-soluble poly...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/016G03F7/04
Inventor 朱代才黎园廖永康吴永忠吴春林
Owner CHINA PETROCHEMICAL CORP
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