Optical switch
A technology of optical gate switch and optical waveguide, applied in optics, nano-optics, nonlinear optics, etc., can solve the problems of large size and instability of gate switch, and achieve the effect of high stability
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no. 1 example
[0063] A preferred embodiment for forming a monolithically integrated shutter switch will be described.
[0064] In order to facilitate the growth of a quantum well structure that produces a phase modulation effect due to interband transitions, an InP substrate is used as a wafer for forming an optical integrated circuit.
[0065] After growing the InP buffer layer on the InP substrate by the molecular beam epitaxy method, it is further grown so that the number of cycles of the growth is suitable for the InGaAs / AlAsSb coupled double quantum well structure disclosed in detail (S.Gozu et al., AppliedPhysicsExpress, 2 , 042201-1-3 (2009).) or indicates the thickness required for a quantum well structure equal to or greater than the phase modulation effect of the quantum well to function as a waveguide, after which an upper cladding layer of 1 μm thickness is grown . As a material of the upper cladding layer, any one of InP, InAlAs, and GaAlAsSb is used. The multi-layered InGaAs...
no. 2 example
[0094] In the second embodiment, an improvement is made on the basis of the basic structure of the first embodiment, that is, the propagation loss of the element is reduced for TE polarized signal light. refer to Figure 7 to explain. Figure 7 shows the basic structure diagram of the present invention (refer to figure 1 ) is a structure for reducing the loss of the signal light of the waveguide other than the phase modulation part. By phosphorus ion implantation and rapid thermal annealing, to make Figure 7 Quantum well mixing occurs outside the region of the phase modulation section 15 . The structure of the second embodiment is produced by the same method as that of the first embodiment, however, it is different in the following process. Using SiO 2 For example, a mask is formed on a region corresponding to the phase modulation portion 15 on a wafer used for fabrication of an optical integrated circuit. Next, for example, a dose of 1×10 14 ~1×10 15 / cm 2 P or As i...
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