Conductive ink, transparent conductor and preparation method thereof
A technology of transparent conductors and conductive inks, applied in inks, household appliances, applications, etc., can solve the problems of uneven filling thickness of conductive materials, breakage of conductive layer wires, difficulty in ensuring production yield, etc., to improve production efficiency and yield. Effect
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[0088] The preparation method of the above-mentioned transparent conductor uses conductive graphite that does not contain organic solvents to fill the grid grooves in the medium layer, and the conductive ink is cured to form a conductive layer embedded in the medium layer. The above-mentioned conductive ink has a high solid content and does not contain organic solvents. Using this conductive ink can realize that the conductive layer formed after one-time filling and curing can fill the grid grooves without multiple fillings, thereby improving yield and efficiency.
[0089] Moreover, this preparation method is manufactured by embossing process and filling process. Compared with the traditional ITO film as the conductive layer process, the conductive layer can be formed in one step, the process is simple, and expensive equipment such as sputtering and evaporation is not required. High efficiency, suitable for large area and mass production. In addition, the cost of materials is ...
Embodiment 1
[0093] Preparation of transparent conductors
[0094] (1) Provide a transparent substrate, coat the dielectric material on the transparent substrate, and form a dielectric layer laminated on the transparent substrate after curing; where the transparent substrate is a polyethylene terephthalate (PET) resin substrate, the transparent substrate The thickness is 0.02 mm, the material of the dielectric layer is polymethyl methacrylate (PMMA) UV glue, and the thickness of the dielectric layer is 3 microns;
[0095] (2) Use an imprint template to imprint on the dielectric layer and UV-cure to form grid grooves, and the groove depth of the grid grooves is 2 microns;
[0096] (3) Fill the grid groove with conductive ink, irradiate with ultraviolet light with a wavelength of 365 nm, and the irradiation energy is 600mj / cm 2 . After the conductive ink is cured, a conductive layer embedded in the medium layer is formed to obtain a transparent conductor; wherein, the thickness of the cond...
Embodiment 2
[0098] (1) Provide a transparent substrate, coat the dielectric material on the transparent substrate, and form a dielectric layer laminated on the transparent substrate after curing; wherein, the transparent substrate is a glass substrate, the thickness of the transparent substrate is 1.2 mm, and the material of the dielectric layer is poly Methyl methacrylate (PMMA) UV glue, the thickness of the dielectric layer is 10 microns;
[0099] (2) Emboss and UV-cure the dielectric layer with an embossing template to form grid grooves, and the groove depth of the grid grooves is 5 microns;
[0100] (3) Fill the grid grooves with conductive ink, and irradiate with ultraviolet light with a wavelength of 365 nanometers, and the irradiation energy is 800mj / cm 2 . After the conductive ink is cured, a conductive layer embedded in the medium layer is formed to obtain a transparent conductor; wherein, the thickness of the conductive layer is 5 microns, and the conductive ink includes the fo...
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